Cu nano point@BN nanosphere compound, and preparation method and application thereof
A nano-dot and nano-sphere technology is applied in the field of Cu nano-dot@BN nano-sphere composite electromagnetic wave absorbing material and its preparation, achieving the effects of simple preparation process conditions, excellent electromagnetic absorption ability, and easy control.
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[0036] Example 1
[0037] will figure 1 The device shown is opened and tungsten is used as the cathode. The anode target material consumed is a block of pure copper powder and boron powder (mass ratio 10:90), which is placed on a cooling water platform. Keep a distance of 30 mm between the cathode tungsten electrode and the anode target copper-boron powder block. During the whole process, the furnace body and anode placement platform are cooled by passing water. Place a liquid nitrogen cooling wall around the anode platform, and maintain a distance of 10 cm between the liquid nitrogen cooling wall and the anode target. After the entire working chamber is evacuated by the vacuum system, argon and nitrogen are introduced. The partial pressure of argon is 0.5 MPa and the partial pressure of nitrogen is 3.0 MPa. The DC power supply is connected and the voltage is 40 V. During the arc discharge process, the operating current and voltage are adjusted to be relatively stable. The Cu ...
Example Embodiment
[0038] Example 2
[0039] will figure 1 The device shown is opened and tungsten is used as the cathode. The anode target material consumed is a block of pure copper powder and boron powder (mass ratio 20:80), which is placed on a cooling water platform. Keep a distance of 2 mm between the cathode tungsten electrode and the anode target copper-boron powder block. During the whole process, the furnace body and anode placement platform are cooled by passing water. Place a liquid nitrogen cooling wall around the anode platform, and keep a distance of 5 cm between the liquid nitrogen cooling wall and the anode target. After the entire working chamber is evacuated by the vacuum system, argon and nitrogen are introduced. The partial pressure of argon is 0.01 MPa and the partial pressure of nitrogen is 0.1 MPa. The DC power supply is connected and the voltage is 10 V. During the arc discharge process, the operating current and voltage are adjusted to be relatively stable. The Cu nanod...
Example Embodiment
[0040] Example 3
[0041] will figure 1 The shown device is opened and tungsten is used as the cathode. The anode target material consumed is a block of pure copper powder and boron powder (mass ratio 15:85), which is placed on a cooling water platform. Keep a distance of 10 mm between the cathode tungsten electrode and the anode target copper-boron powder block. During the whole process, the furnace body and anode placement platform are cooled by passing water. Place a liquid nitrogen cooling wall around the anode platform, and keep a distance of 7 cm between the liquid nitrogen cooling wall and the anode target. After the entire working chamber is evacuated by the vacuum system, argon and nitrogen are introduced. The partial pressure of argon is 0.1 MPa and the partial pressure of nitrogen is 1.0 MPa. The DC power supply is connected and the voltage is 20 V. During the arc discharge process, the operating current and voltage are adjusted to be relatively stable. The Cu nanod...
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