Cr nanodot @BN nanosphere compound as well as preparation method and application thereof
A technology of nano-dots and nano-spheres, applied in the fields of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., to achieve the effects of excellent electromagnetic absorption ability, easy control, and simple preparation process conditions
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] Will figure 1 The device shown is opened, tungsten is used as the cathode, and the consumed anode target is composed of pure chromium powder and boron powder (mass ratio 10:90) pressed into a block, which is placed on a cooling water platform. A distance of 30 mm is maintained between the cathode tungsten electrode and the anode target chromium-boron powder block. During the whole process, water is passed to cool the furnace body and the anode placement platform. A liquid nitrogen cooling wall was placed around the anode platform, and a distance of 10 cm was maintained between the liquid nitrogen cooling wall and the anode target. After the whole working chamber is evacuated by the vacuum system, argon and nitrogen are introduced, the partial pressure of argon is 0.5 MPa, the partial pressure of nitrogen is 3.0 MPa, the DC power supply is connected, and the voltage is 40 V. During the arc discharge process, adjust the working current and voltage to keep relatively sta...
Embodiment 2
[0039] Will figure 1 The device shown is opened, tungsten is used as the cathode, and the anode target consumed is a block made of pure chromium powder and boron powder (mass ratio 20:80), which is placed on a cooling water platform. A distance of 2 mm is maintained between the cathode tungsten electrode and the anode target chromium-boron powder block. During the whole process, water is passed to cool the furnace body and the anode placement platform. A liquid nitrogen cooling wall was placed around the anode platform, and a distance of 5 cm was kept between the liquid nitrogen cooling wall and the anode target. After the whole working chamber is evacuated by the vacuum system, argon and nitrogen are introduced, the partial pressure of argon is 0.01 MPa, the partial pressure of nitrogen is 0.1 MPa, the DC power supply is connected, and the voltage is 10 V. During the arc discharge process, adjust the working current and voltage to keep relatively stable. The Cr nanodots@BN...
Embodiment 3
[0041] Will figure 1 The device shown is opened, and tungsten is used as the cathode, and the anode target consumed is a block made of pure chromium powder and boron powder (mass ratio 15:85), which is placed on a cooling water platform. A distance of 10 mm is maintained between the cathode tungsten electrode and the anode target chromium-boron powder block. During the whole process, water is passed to cool the furnace body and the anode placement platform. A liquid nitrogen cooling wall was placed around the anode platform, and a distance of 7 cm was maintained between the liquid nitrogen cooling wall and the anode target. After the whole working chamber is evacuated by the vacuum system, argon and nitrogen are introduced, the partial pressure of argon is 0.1 MPa, the partial pressure of nitrogen is 1.0 MPa, the DC power supply is connected, and the voltage is 20 V. During the arc discharge process, adjust the working current and voltage to keep relatively stable. The Cr n...
PUM
Property | Measurement | Unit |
---|---|---|
Diameter | aaaaa | aaaaa |
Diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com