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Flexible nanoimprint template and preparation method thereof

A technology of nanoimprinting and template, which is applied in the direction of photomechanical equipment, patterned surface photolithography, optics, etc. It can solve the problems of further improvement of mechanical properties, high cost of silicon template preparation, and inability to make flexible templates. Achieve good light acid corrosion resistance, good mechanical properties, and good thermal conductivity

Inactive Publication Date: 2018-11-02
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, using an amorphous alloy sheet as a template cannot make a flexible template, and its mechanical properties need to be further improved; in addition, the cost of using an amorphous alloy sheet as a template is high: the demoulding method is to corrode the silicon template, which means The master template can only be used once, and the cost of silicon template preparation (especially large-area nanoscale silicon templates) is very high; therefore, templates made of amorphous alloy sheets are used in roll-to-roll nanoimprinting, especially for small sizes Applications in the field of precision nanoimprinting are limited

Method used

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  • Flexible nanoimprint template and preparation method thereof
  • Flexible nanoimprint template and preparation method thereof
  • Flexible nanoimprint template and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] Put 10 microliters of FDTS (1H,1H,2H,2H-perfluorodecyltrichlorosilane) into 20ml of heptane, and then soak the prepared silicon template for 10 minutes, then remove the silicon template with pure Wash with heptane, and finally bake on a hot plate at 100°C for 10 minutes to complete the hydrophobic treatment of the silicon template. The next step is magnetron sputtering, with Zr 55 Cu 30 Ni 5 al 10 A single target of composition sputters a 1 micron thick amorphous alloy film on a silicon template with a power of 70W. Then sputter a layer of about 100nm nickel as a seed layer, and then perform electroplating in a nickel sulfamate solution to thicken it to about 100 microns. Finally, the amorphous alloy layer and the nickel base layer are peeled off from the silicon template to make a flexible nanoimprint template. The manufacturing process of the flexible nanoimprint template in this embodiment is as follows figure 2 shown.

[0061] Fig. 5(a) is a SEM image of the ...

Embodiment 2

[0063] The fabricated silicon template with a 600nm line width grating was thermally embossed on a polycarbonate sheet (PC) at 175° C. with a pressure of 500 MPa. Subsequent next step is magnetron sputtering, with Zr 55 Cu 30 Ni 5 al 10 A single target of composition sputters an amorphous alloy film about 1 micron thick on a silicon template with a power of 70W. Then sputter a layer of about 100nm nickel as a seed layer, and then perform electroplating in a nickel sulfamate solution to thicken it to about 100 microns. Finally, the amorphous alloy layer and the nickel base layer are peeled off from the PC sheet to make a flexible nanoimprint template. The manufacturing process of the flexible nanoimprint template in this embodiment is as follows image 3 shown.

[0064] Fig. 6(a) is a SEM image of the flexible nanoimprint template prepared in this example, and Fig. 6(b) is an AFM image of the flexible nanoimprint template prepared in this example. It can be seen from Figu...

Embodiment 3

[0066] Spin-coat a layer of electron beam photoresist HSQ on a silicon wafer or ITO conductive glass, and then use an electron beam to write nanoscale patterns on the HSQ on a silicon wafer or ITO glass, and then perform magnetron sputtering after development, using Zr 55 Cu 30 Ni 5 al 10 A single target of composition sputters a 1 micron thick amorphous alloy film on a silicon template with a power of 70W. Then sputter a layer of about 100nm nickel as a seed layer, and then perform electroplating in a nickel sulfamate solution to thicken it to about 100 microns. Finally, the amorphous alloy layer and the nickel base layer are peeled off from the silicon template or the ITO template to make a flexible nanoimprint template. The manufacturing process of the flexible nanoimprint template in this embodiment is as follows Figure 4 shown.

[0067] The flexible nano-imprint template prepared in Examples 1-3 was tested by a nano-indentation instrument, and the Young's modulus was...

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Abstract

The invention provides a flexible nanoimprint template and a preparation method thereof. The flexible nanoimprint template of the present invention is a composite of an amorphous alloy layer and a nickel base layer. The flexible nanoimprint template of the invention combines the advantages of high hardness and good ductility performance of nickel metal and smooth corrosion resistance of amorphousalloy, has a roughness of 1 nm or less, is convenient for demoulding, has good flexibility, has good mechanical property and photoacid corrosion resistance, and is especially suitable for nanoimprinting of graphics of small size and high precision.

Description

technical field [0001] The invention belongs to the technical field of nano-imprint templates, and relates to a flexible nano-imprint template and a preparation method thereof. Background technique [0002] Nanoimprint technology is a brand-new nano-pattern replication method first proposed by Stephen Y.Chou of Princeton University in the United States in the 1990s. This technology applies the traditional template replication principle to the field of micro-manufacturing, and overcomes the limitations and requirements of traditional optical lithography on special exposure beam sources, high-precision focusing systems, and extremely short-wavelength lens systems. It has ultra-high resolution and high output. and low cost features. Nanoimprint technology is mainly used in the manufacturing process of precision nanostructure devices such as integrated circuits, high-density magnetic memory electrophoretic chips, waveguide polarizers, quantum devices, and polarized light naviga...

Claims

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Application Information

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IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 程鑫黄兴隆
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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