Combined strengthening treatment method for plasma immersion ion implantation and deposition on surfaces of spallation target balls

An immersion ion implantation and plasma technology, which is applied in the field of powder metallurgy, can solve the problems of insufficient bonding force of the film base, low bombardment strength of the target ball surface, and easy peeling of the film layer, and achieves low friction coefficient and good wear resistance. , The effect of improving hardness and bearing capacity

Active Publication Date: 2018-12-11
INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the target ball is prepared by powder metallurgy technology. W, Ni, and Fe particles will finally form W element and FeNi alloy in the process of high-temperature heating and pressure extrusion, instead of forming an intermetallic compound with a uniform structure. Therefore, the particles inside the target ball The bonding force between them is very low. Although common coating techniques (such as magnetron sputtering coating and vacuum evaporation coating) can obtain uniform and thick film layers, due to the low energy of plasma in the early stage of film formation, The bombardment intensity on the surface of the target ball is low, so an obvious interface layer is formed between the film and the substrate due to the lack of weak ion bombardment, the bonding force of the film base is not strong enough, and the film layer is easy to peel off. For the spallation target circulation system in the CiADS system As far as the spallation target particles are concerned, the above technology cannot meet the requirements of practical application

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  • Combined strengthening treatment method for plasma immersion ion implantation and deposition on surfaces of spallation target balls
  • Combined strengthening treatment method for plasma immersion ion implantation and deposition on surfaces of spallation target balls

Examples

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Embodiment 1

[0040] A metal plasma immersion ion implantation and deposition compound strengthening treatment method on the surface of a spallation target ball, the strengthening treatment method comprising the following steps:

[0041] (1) The spallation target sphere is ultrasonically cleaned twice in an ethanol solution with a purity of 99.9%;

[0042] (2) Place the spallation target ball on the vacuum target table, vacuumize and start the sputtering cleaning equipment for argon ion sputtering cleaning, the flow rate of argon gas is controlled at 15 sccm, and the working pressure is 1.0×10 -1 Pa, the bias amplitude is 2 kV, the bias pulse width is 80 μs, the pulse frequency is 75 Hz, the RF power is 200 W, and the processing time is 40 min;

[0043] (3) Titanium ions are purely implanted into the spallation target ball. The titanium plasma is generated from cast titanium with a purity of 99.99% as the cathode through a magnetic filter pulse cathode arc source. The working pressure of t...

Embodiment 2

[0054] A metal plasma immersion ion implantation and deposition compound strengthening treatment method on the surface of a spallation target ball, the strengthening treatment method comprising the following steps:

[0055] (1) The spallation target sphere is ultrasonically cleaned twice in an ethanol solution with a purity of 99.9%;

[0056] (2) Place the spallation target ball on the vacuum target table, vacuumize and start the sputtering cleaning equipment for argon ion sputtering cleaning, the flow rate of argon gas is controlled at 30 sccm, and the working pressure is 6.0×10 -1 Pa, the bias amplitude is 3 kV, the bias pulse width is 120 μs, the pulse frequency is 90 Hz, the RF power is 400 W, and the processing time is 50 min;

[0057] (3) Pure titanium ion implantation is carried out on the spallation target ball. The titanium plasma is generated by cast titanium with a purity of 99.99% as the cathode through the magnetic filter pulse cathode arc source. The working pre...

Embodiment 3

[0067] A metal plasma immersion ion implantation and deposition compound strengthening treatment method on the surface of a spallation target ball, the strengthening treatment method comprising the following steps:

[0068] (1) The spallation target sphere is ultrasonically cleaned twice in an ethanol solution with a purity of 99.9%;

[0069] (2) Place the spallation target ball on the vacuum target table, vacuumize and start the sputtering cleaning equipment for argon ion sputtering cleaning, the argon gas flow rate is controlled at 25 sccm, and the working pressure is 3.0×10 -1 Pa, the bias amplitude is 2.5 kV, the bias pulse width is 100 μs, the pulse frequency is 80 Hz, the RF power is 300 W, and the processing time is 45 min;

[0070] (3) Pure titanium ion implantation is performed on the spallation target ball. The titanium plasma is generated by the cast titanium with a purity of 99.99% as the cathode through the magnetic filter pulse cathode arc source. The working pr...

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Abstract

The invention relates to the technical field of powder metallurgy, and more specifically, discloses a combined strengthening treatment method for metal plasma immersion ion implantation and depositionon the surfaces of spallation target balls. The strengthening treatment method comprises the steps of carrying out pre-treatment of the spallation target balls, carrying out TiSiN, TiAlN, TiAlSiN, TiAlSiN/h-BN ion implantation and deposition, and the like. The method has the advantages that the problems that the wear rate of the spallation target tungsten-iron-nickel target balls in a non-intermetallic compound form prepared through a powder metallurgy technology is high, the residual stress between a thin film and a matrix is large, the film-matrix binding force is poor, and the bearing capacity of a single film layer is poor can be solved, the surface of the thin film is effectively prevented from being peeled off, and a functionally gradient composite material which is high in film-matrix binding force, high in hardness, low in friction coefficient and high in wear resistance can be prepared.

Description

technical field [0001] The invention relates to the technical field of powder metallurgy, and more particularly relates to a metal plasma immersion ion implantation and deposition composite strengthening treatment method on the surface of a spallation target ball. Background technique [0002] In 2011, the Institute of Modern Physics of the Chinese Academy of Sciences proposed that during the spallation reaction, a small-sized particle target should be used instead of a block target or a liquid target to generate high neutrons when strong protons bombard the target ball, providing a neutron source for the reactor. The advantage of this design is that the heat generated by the spallation reaction can be released externally quickly through the circulation process of the small-sized target ball, and the neutron yield of the spallation reaction can be effectively increased. In the spallation target system, due to the spallation reaction, a large number of radioactive rays, such ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/16C23C14/48C23C14/54
CPCC23C14/021C23C14/0641C23C14/16C23C14/48C23C14/54
Inventor 吕文泉何源王志光刘杰
Owner INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI
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