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A mass spectrometry method for detecting sulfonate genotoxic impurities based on dielectric barrier discharge ion source

A technology of dielectric barrier discharge and detection method, applied in ion source/gun, mass spectrometer, discharge tube, etc., can solve the problems of unreported analysis method, excessive ethyl methanesulfonate level, and product withdrawal, etc., to achieve sensitive and fast Analytical methods, high-throughput drug screening, and simple device construction

Active Publication Date: 2019-01-11
SHANDONG ANALYSIS & TEST CENT
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

In 2007, it was found in the detection of the HIV drug nelfinavir (Viracept) that the level of ethyl methanesulfonate exceeded the standard due to the reaction of methanesulfonic acid in the raw material with residual ethanol, which led to the withdrawal of the product from the European market
At present, there is no report on the accurate and sensitive analysis of sulfonate genotoxic impurities using dielectric barrier discharge ion source

Method used

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  • A mass spectrometry method for detecting sulfonate genotoxic impurities based on dielectric barrier discharge ion source
  • A mass spectrometry method for detecting sulfonate genotoxic impurities based on dielectric barrier discharge ion source
  • A mass spectrometry method for detecting sulfonate genotoxic impurities based on dielectric barrier discharge ion source

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Embodiment 1

[0051] A dielectric barrier discharge ionization mass spectrometric analysis method for genotoxic impurity methyl p-toluenesulfonate in medicines, comprising the following steps:

[0052] (1) Instruments and reagents

[0053] Dielectric Barrier Discharge Ion Source Chassis, Dielectric Barrier Discharge Ion Source (Ningbo Huayi Ningchuang Intelligent Technology Co., Ltd., China); LTQ Ion Trap Mass Spectrometer (Thermo Fisher, USA); Heating Station (Azowan, Japan); XS 105 Electronic balance (Mettler, Switzerland); QL-901 vortex mixer (Qilin Bell Instrument Co., Ltd., Haimen City).

[0054] Acetonitrile, methanol, acetone (chromatographically pure, Merck, Germany); methyl p-toluenesulfonate (chromatographic standard, Sinopharm Chemical Reagent Beijing Co., Ltd.); helium (99.99%, Jinan Kangwei Gas Co., Ltd.); others All reagents were of analytical grade and purchased from Jinan Jinhai Technology Co., Ltd.

[0055] Drug samples are in powder form.

[0056] (2) Sample preparation...

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Abstract

The invention provides a mass spectrometry detection method of sulfonate genotoxic impurities based on a dielectric barrier discharge ion source, and belongs to the technical field of pharmaceutical analysis. The method comprises the following steps: a sample solution is dripped as a sample point at a certain interval in the length direction of the sample table, the sample point is dried naturally, the dielectric barrier discharge ion source is aligned with the mass spectrometer at the front end of the sample point, the dielectric barrier discharge ion source is turned on, the heating platformand the mass spectrometer are in a working state, and mass spectrometry analysis and detection are carried out. A method for directly detect genotoxic impurities in medicine by dielectric barrier discharge ionization mass spectrometry is disclosed, From the sample preparation to the result, the rapid detection and analysis of the genotoxic impurity methyl p-toluenesulfonate in the drug can be completed in a few minutes. The established method can detect and analyze the methyl p-toluenesulfonate in the drug sensitively and quickly, thus realizing the high-throughput drug screening, and has good practical application value.

Description

technical field [0001] The invention belongs to the technical field of drug analysis, and in particular relates to a rapid mass spectrometric detection method for sulfonate genotoxic impurities based on a dielectric barrier discharge ion source. Background technique [0002] Genotoxic impurities refer to substances that can directly or indirectly damage DNA, cause gene mutation or have a tendency to cause cancer. Genotoxic impurities mainly come from the starting materials, intermediates, reagents and reaction by-products during the synthesis of APIs. In addition, drugs may also be degraded to produce genotoxic impurities during synthesis, storage, or formulation. Genotoxic impurities are characterized by causing damage to human genetic material at very low concentrations, and are mutagenic and carcinogenic, and seriously threaten human health in the course of medication. In recent years, with the increasing regulatory requirements for genotoxic impurities, regulatory agen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/10H01J49/04H01J49/26G01N27/68
CPCG01N27/68H01J49/0409H01J49/0468H01J49/10H01J49/26
Inventor 谢含仪林云良王珊珊陈相峰
Owner SHANDONG ANALYSIS & TEST CENT
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