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Preparation method and application of silicon dioxide surface modified by cyclic choline phosphate polymer

A technology of phosphorylcholine and silicon dioxide, applied in chemical instruments and methods, other chemical processes, etc., can solve problems such as low efficiency, patient suffering, and reduced detection sensitivity, and achieve good stability, good stability, and anti-pollution. powerful effect

Active Publication Date: 2019-01-22
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the complex environment of the body, the detection sensitivity of these devices may be reduced due to the adsorption of proteins and blood, causing inconvenience to the monitoring of diseases
For example, during gastroscopy, if the lens is adhered to the surface of the lens by gastric juice, food or blood and other substances, resulting in ineffective identification and detection, the gastroscope needs to be taken out and rinsed, and then re-observed, which is not only inefficient, but also causes unnecessary inconvenience to the patient. pain

Method used

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  • Preparation method and application of silicon dioxide surface modified by cyclic choline phosphate polymer
  • Preparation method and application of silicon dioxide surface modified by cyclic choline phosphate polymer
  • Preparation method and application of silicon dioxide surface modified by cyclic choline phosphate polymer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] 1) Silica surface treatment:

[0035] Place the purchased silicon dioxide chip of the surface plasmon resonance sensor (SPR) in an ultraviolet ozone cleaner, take it out after being irradiated with ultraviolet light for 30 minutes, wash it three times with ethanol and water in sequence, and dry it with nitrogen gas for later use.

[0036] 2) Synthesis of cyclic phosphorylcholine polymer:

[0037] Step 1: Take a 25mL reaction bottle and add 0.057mmol copper chloride, 0.718mmol 4,4'-dinonyl-2,2'-bipyridyl, 115mmol 2-(trimethylsilyloxy)ethyl methyl Acrylic acid salt, 4.1mL anisole and 115mmol methyl methacrylate, with 0.0718mmol dibromoisobutyrate as the initiator, after degassing and deoxygenation, 0.287mmol cuprous chloride was added under nitrogen protection conditions to react , to prepare synthetic molecule A;

[0038] In the second step, take 0.0081mmol synthetic molecule A and 4.0μmol chloride, 0.0808mmol 4,4'-dinonyl-2,2'-bipyridyl, 12.9mmol dimethylaminoethyl me...

Embodiment 2

[0052] 1) Silica chip processing:

[0053] Place the purchased silicon dioxide chip adapted to the crystal microbalance (QCM-D) in an ultraviolet ozone cleaner, take it out after being irradiated with ultraviolet light for 30 minutes, wash it three times with ethanol and water in sequence, and dry it with nitrogen gas for later use.

[0054] 2) Synthesis of cyclic phosphorylcholine polymer: the method is the same as in Example 1.

[0055] 3) Cyclic phosphorylcholine polymer modification on the surface of silica:

[0056] Method 1: 1 mg of the polymer obtained in 2) was dissolved in 10 mL of deionized water to a final concentration of 0.1 mg / mL. Then take 500 μL of the above solution and drop it on the surface of the silicon dioxide chip obtained in 1), to ensure that the solution completely covers the chip surface, and adsorb for 0.5 h at room temperature. After the reaction, the surface of the silicon dioxide was washed three times with absolute ethanol and water successive...

Embodiment 3

[0062] 1) Prism processing:

[0063] Place the purchased prism in an ultraviolet ozone cleaner, take it out after 30 minutes of ultraviolet light irradiation, wash it three times with ethanol and water successively, and dry it with nitrogen gas for later use.

[0064] 2) Synthesis of cyclic phosphorylcholine polymer: the method is the same as in Example 1.

[0065] 3) Cyclic phosphorylcholine polymer modification on the surface of the prism:

[0066] 1 mg of the polymer obtained in step 2) was dissolved in 10 mL of deionized water to a final concentration of 0.1 mg / mL. Then take 500 μL of the above solution and drop it on the clean prism surface obtained in step 1), ensure that the solution completely covers the prism surface, and adsorb for 0.5 h at room temperature. After the reaction, the surface of the prism was washed three times with absolute ethanol and water successively, and dried with nitrogen gas to obtain a prism modified based on the cyclic phosphorylcholine pol...

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Abstract

The invention discloses a preparation method of silicon dioxide surface modified by cyclic choline phosphate polymer, wherein the preparation method includes the steps: 1) synthesizing a cyclic choline phosphate polymer; 2) preparing the silica surface modified by the cyclic choline phosphate polymer: preparing a cyclic choline phosphate polymer solution with the concentration of 0.1-0.5 mg / mL with deionized water, applying the solution to the cleanly washed silicon dioxide surface, completely covering, and forming an effective circular choline phosphate polymer brush structure, to obtain thesilicon dioxide surface modified by the circular choline phosphate polymer. The invention also discloses an application of the silicon dioxide surface in pollution prevention of proteins and bacteria.Compared with a traditional preparation method of an anti-pollution material surface, the method is simpler and more efficient, and the prepared silicon dioxide surface has good stability and stronganti-pollution ability.

Description

technical field [0001] The invention belongs to the design and preparation method of silicon dioxide anti-pollution surface; in particular, a preparation method and application of silicon dioxide surface modified based on cyclic phosphorylcholine polymer. Background technique [0002] Phosphorylcholine is a zwitterionic material with good hydrophilicity. As the hydrophilic terminal on the surface of the cell membrane, it can provide good biocompatibility for the cell membrane and effectively prevent the adsorption of proteins and cells. Therefore, phosphorylcholine materials are often used as polymerization monomers for the synthesis of related polymers. Such polymers usually have certain anti-pollution properties. Common phosphorylcholine polymers have a linear structure, that is, phosphorylcholine monomer molecules are linked to the main chain of the polymer as side chains, and the monomer molecule content is low, so its anti-pollution effect is not ideal. In addition, t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/26B01J20/30
CPCB01J20/103B01J20/264B01J20/30
Inventor 苏荣欣夏寅强黄仁亮齐崴
Owner TIANJIN UNIV
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