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Self-cleaning, antifogging and thermal-insulation coating glass and preparation method thereof

A technology of coated glass and composite film layer, which is applied in the direction of coating, etc., can solve the problems of inability to effectively prevent the removal of difficult-to-volatile organic pollutants on the glass surface, the loss of anti-fog effect of the glass, and the influence of film transmittance, etc., to achieve self-cleaning performance Excellent, high hardness, good wear resistance

Inactive Publication Date: 2019-03-12
FUJIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the silicon dioxide film is used alone, its surface is easily attached by non-volatile oils or other organic pollutants, blocking its micropores, making the glass surface lose its hydrophilicity and forming a hydrophobic surface, and moisture cannot spread on the glass surface. Come, the glass loses its anti-fog effect
Silica itself has no self-cleaning effect, and cannot effectively prevent and remove volatile organic pollutants on the glass surface
If SiO 2 As the outermost layer, since the surface of the film is rich in hydrophilic groups (Si–OH), it is easy to absorb water vapor from the surrounding environment, resulting in a decrease in the light transmittance of the film.
In addition, the dust in the air is also easy to adsorb on the surface of the film. If the film does not have self-cleaning performance, it will affect the film transmittance.

Method used

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  • Self-cleaning, antifogging and thermal-insulation coating glass and preparation method thereof
  • Self-cleaning, antifogging and thermal-insulation coating glass and preparation method thereof
  • Self-cleaning, antifogging and thermal-insulation coating glass and preparation method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Embodiment 1, the glass preparation method of the present invention comprises the following steps:

[0024] 1) Clean the substrate with a cleaning machine;

[0025] 2) Inner layer: The substrate is sent to the coating chamber, and the SiO is sputtered by radio frequency magnetron 2 layer, the temperature of the substrate is 25°C, the negative bias voltage is 100V, the working pressure is 0.2Pa, the substrate speed is 2rpm, the silicon dioxide target current is 2A, the argon gas flow rate is 15mL / min, the sputtering time is 10min, the RF power is 100W, and the two The distance between the silicon oxide target and the substrate is 40mm;

[0026] 3) Intermediate layer: continue RF magnetron sputtering of SiO 2 +DLC layer, the temperature of the substrate is 25°C, the negative bias voltage is 100V, the working pressure is 0.2Pa, the substrate speed is 2rpm, the current of the silicon dioxide target is 2A, the current of the carbon target is 2A, the flow rate of argon gas ...

Embodiment 2

[0028] Embodiment 2, the glass preparation method of the present invention comprises the following steps:

[0029] 1) Clean the substrate with a cleaning machine;

[0030] 2) Inner layer: The substrate is sent to the coating chamber, and the SiO is sputtered by radio frequency magnetron 2 layer, the temperature of the substrate is 40°C, the negative bias voltage is 120V, the working pressure is 0.8Pa, the substrate speed is 5rpm, the silicon dioxide target current is 4A, the argon gas flow rate is 20mL / min, the sputtering time is 30min, the radio frequency power is 300W, and the two The distance between the silicon oxide target and the substrate is 50mm;

[0031] 3) Intermediate layer: continue RF magnetron sputtering of SiO 2 +DLC layer, the temperature of the substrate is 40°C, the negative bias voltage is 120V, the working pressure is 0.8Pa, the substrate speed is 5rpm, the current of the silicon dioxide target is 4A, the current of the carbon target is 4A, the flow rate ...

Embodiment 3

[0033] Embodiment 3, the glass preparation method of the present invention comprises the following steps:

[0034] 1) Clean the substrate with a cleaning machine;

[0035] 2) Inner layer: The substrate is sent to the coating chamber, and the SiO is sputtered by radio frequency magnetron 2 layer, the temperature of the substrate is 60°C, the negative bias voltage is 150V, the working pressure is 1Pa, the substrate speed is 8rpm, the silicon dioxide target current is 4A, the argon gas flow rate is 25mL / min, the sputtering time is 50min, the radio frequency power is 300W, the dioxide The distance between the silicon target and the substrate is 60mm;

[0036] 3) Intermediate layer: continue RF magnetron sputtering of SiO 2 +DLC layer, the temperature of the substrate is 60°C, the negative bias voltage is 150V, the working pressure is 1Pa, the substrate speed is 8rpm, the silicon dioxide target current is 4A, the carbon target current is 4A, the argon gas flow rate is 25mL / min, a...

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Abstract

The invention discloses self-cleaning, antifogging and thermal-insulation coating glass and a preparation method thereof. The glass comprises a basal plate, wherein the surface of the basal plate is provided with a composite film layer, the composite film layer successively comprises an inner layer, an intermediate layer and an outer layer from inside to outside, the inner layer is a silicon dioxide layer, the intermediate layer is a silicon dioxide and diamond-like layer, and the outer layer is a fluorination diamond-like layer. The glass of the invention has a good self-cleaning, antifoggingand thermal-insulation function, and the binding strength among the film layers is high.

Description

technical field [0001] The invention relates to the field of coated glass, in particular to a self-cleaning, anti-fog, heat-insulating coated glass and a preparation method thereof. Background technique [0002] Glass is an amorphous inorganic non-metallic material, generally made of a variety of inorganic minerals (such as quartz sand, borax, boric acid, barite, barium carbonate, limestone, feldspar, soda ash, etc.) Yes, its main components are silica and other oxides. The chemical composition of ordinary glass is Na 2 SiO 3 , CaSiO 3 , SiO 2 or Na 2 OCaO 6 SiO 2 Etc., the main component is silicate double salt, which is an amorphous solid with random structure, which is widely used in buildings to block wind and transmit light. Silicon dioxide (SiO 2 ) as an inorganic thin film material on the glass surface is a good choice, because silica is an inorganic material with stable physical and chemical properties, good heat resistance, wear resistance and mechanical pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34
CPCC03C17/3452C03C2218/156
Inventor 简明德王乾廷董俊豪
Owner FUJIAN UNIV OF TECH
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