BGSFMC/CNFO multiferroic composite film and preparation method thereof
A composite thin film and multiferroic technology, applied in coatings and other directions, can solve the problems of deterioration of ferroelectric properties, difficulty in obtaining multiferroic properties, and magnetoelectric coupling effects, etc., to achieve easy control of doping amount, simple equipment requirements, and experimental The effect of easy conditions
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[0035] The preparation method of described BGSFMC / CNFO multiferroic composite thin film comprises the following steps:
[0036] Step 1: Dissolve cobalt nitrate and nickel nitrate in ethylene glycol methyl ether in a molar ratio of (1-x):x, add acetic anhydride after stirring evenly, and continue stirring evenly to obtain the bottom film precursor solution; wherein x=0.10 ~0.50;
[0037] Step 2: Spin-coat the bottom layer film precursor solution on the FTO / glass substrate to obtain a wet film. After the wet film is evenly glued, it is baked at 190-195°C to obtain a dry film, and then annealed in air at 660-710°C , to obtain crystalline Co 1-x Ni x Fe 2 o 4 film;
[0038] Step 3: The crystalline Co 1-x Ni x Fe 2 o 4 The film was cooled to room temperature, and step 2 was repeated until the desired thickness was obtained, that is, the underlying film Co 1-x Ni x Fe 2 o 4 film.
[0039] Step 4: Dissolve bismuth nitrate, strontium nitrate, gadolinium nitrate, iron nit...
Embodiment 1
[0051] Step 1: Clean the FTO / glass substrate with detergent, acetone, and absolute ethanol respectively and seal it in absolute ethanol for later use;
[0052] Step 2: Cobalt nitrate and nickel nitrate are used as raw materials, dissolved in ethylene glycol methyl ether at a molar ratio of 0.9:0.1 (x=0.10), stirred for 30 minutes, then added with acetic anhydride, stirred for 90 minutes, and the total concentration of metal ions is 0.2 mol / L stable bottom film precursor; wherein the volume ratio of ethylene glycol methyl ether and acetic anhydride is 3:1;
[0053] Step 3: Wash the FTO / glass substrate with deionized water and use N 2 Blow dry, and then irradiate the clean FTO / glass substrate with an ultraviolet light irradiation instrument for 40 minutes, so that the surface of the FTO / glass substrate reaches atomic cleanliness, and then spin-coat the precursor solution on the FTO / glass substrate, and the coating speed is 4000r / min, the homogenization time is 15s to obtain a ...
Embodiment 2
[0058]Step 1: Clean the FTO / glass substrate with detergent, acetone, and absolute ethanol respectively and seal it in absolute ethanol for later use;
[0059] Step 2: Cobalt nitrate and nickel nitrate are used as raw materials, dissolved in ethylene glycol methyl ether at a molar ratio of 0.7:0.3 (x=0.30), stirred for 30 minutes, then added with acetic anhydride, stirred for 90 minutes, and the total concentration of metal ions is 0.2 mol / L stable bottom film precursor; wherein the volume ratio of ethylene glycol methyl ether and acetic anhydride is 3:1;
[0060] Step 3: Wash the FTO / glass substrate with deionized water and use N 2 Blow dry, and then irradiate the clean FTO / glass substrate with an ultraviolet light irradiation instrument for 40 minutes, so that the surface of the FTO / glass substrate reaches atomic cleanliness, and then spin-coat the precursor solution on the FTO / glass substrate, and the coating speed is 4000r / min, the homogenization time is 15s to obtain a w...
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