Low-radiation coated glass and processing technology thereof

A low-emission coating and processing technology, applied in the direction of coating, can solve the problems of weak bending resistance, low oxide brittleness, limited application scope, etc., to achieve high practicability, stable chemical properties, and improved corrosion resistance. Effect

Active Publication Date: 2019-05-10
蚌埠兴科玻璃有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] With the research and deepening of coated glass, our performance and demand for glass are getting higher and higher. Today's coated glass generally uses an oxide film to block the silver layer and the dielectric layer to avoid affecting the performance of the silver layer. However, in practice In use, the brittleness of oxides is low, and the bending resistance is not strong, which greatly limits our application range, which brings us great inconvenience

Method used

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  • Low-radiation coated glass and processing technology thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] First clean the glass substrate, put the glass substrate into the concentrated sulfuric acid solution of potassium permanganate and soak it for 18 hours, then wash it with deionized water, then put it into acetone and ethanol for 10 minutes ultrasonic cleaning respectively, and then rinse it with deionized water 5min, nitrogen drying, standby;

[0050] Then sputter the first dielectric layer on the surface of the glass substrate, and first sputter the zinc stannate layer in the argon and oxygen atmosphere: choose zinc-tin alloy as the target material, and the mass ratio of zinc and tin is 54:46; Take the obtained zinc-tin alloy target and glass substrate, and sputter on the glass substrate in the atmosphere of argon and oxygen. -3 Pa, the spacing of the base target is 2mm, the working pressure is 0.2Pa, the sputtering power is 30W, the sputtering time is 0.5h, and the flow rate of oxygen is 60sccm; then coating is carried out to obtain the zinc stannate layer; then heat...

Embodiment 2

[0059] First clean the glass substrate, soak the glass substrate in concentrated sulfuric acid solution of potassium permanganate for 20 hours, then wash it with deionized water, then put it into acetone and ethanol for ultrasonic cleaning for 13 minutes, and then rinse it with deionized water 8min, nitrogen drying, standby;

[0060] Then sputter the first dielectric layer on the surface of the glass substrate, and first sputter the zinc stannate layer in the argon and oxygen atmosphere: choose zinc-tin alloy as the target material, and the mass ratio of zinc and tin is 54:48; Take the obtained zinc-tin alloy target and glass substrate, and sputter on the glass substrate in the atmosphere of argon and oxygen. The process parameters of magnetron sputtering coating are: the degree of vacuum is 3.0×10 -5Pa, the spacing of the base target is 4mm, the working pressure is 1Pa, the sputtering power is 120W, the sputtering time is 1h, and the flow rate of oxygen is 65sccm; The temper...

Embodiment 3

[0069] First clean the glass substrate, put the glass substrate into the concentrated sulfuric acid solution of potassium permanganate and soak for 24 hours, then wash it with deionized water, then put it in acetone and ethanol for ultrasonic cleaning for 15 minutes, and then rinse it with deionized water 10min, nitrogen drying, standby;

[0070] Then sputter the first dielectric layer on the surface of the glass substrate, and first sputter the zinc stannate layer in the atmosphere of argon and oxygen: choose zinc-tin alloy as the target material, and the mass ratio of zinc and tin is 54:50; Take the obtained zinc-tin alloy target and glass substrate, and sputter on the glass substrate in the atmosphere of argon and oxygen. -5 Pa, the spacing of the base target is 6mm, the working pressure is 1.5Pa, the sputtering power is 160W, the sputtering time is 1.5h, and the flow rate of oxygen is 70sccm; then carry out coating, make described zinc stannate layer; Carry out heat treatm...

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Abstract

The invention discloses low-radiation coated glass and a processing technology thereof. The coated glass comprises a glass substrate. The surface of the glass substrate is outwards successively provided with a first dielectric layer, a first blocking layer, a functional layer, a second blocking layer, and a second dielectric layer, wherein a preferable scheme is that the first blocking layer and the second blocking layer are a graphene layer, and the first blocking layer and the second blocking layer are 20-35 nm in thickness. The provided low-radiation coated glass is rational in matching design, and simple in technological operation. The low-radiation coated glass is effectively prepared by the processing technology, and a film layer of the coated glass is optimized and improved. Radiance of the coated glass is reduced, and light transmissivity and far-infrared reflectivity thereof are improved. The film layer is better in uniformity and more stable in performance, and service life of the coated glass is improved. The low-radiation coated glass has higher practicability.

Description

technical field [0001] The invention relates to the technical field of coated glass, in particular to low-radiation coated glass and its processing technology. Background technique [0002] Low-emissivity coated glass, also known as Low-E glass, is generally coated with a metal film or metal oxide film containing one or two or even multi-layer films on the glass surface by physical or chemical methods to reduce energy absorption or control Indoor and outdoor energy exchange ensures the comfort of life and work, and achieves the purpose of environmental protection and energy saving. [0003] With the research and deepening of coated glass, our performance and demand for glass are getting higher and higher. Today's coated glass generally uses an oxide film to block the silver layer and the dielectric layer, so as to avoid the performance of the silver layer from being affected, but in practice In use, the brittleness of oxides is low, and the bending resistance is not strong,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36
CPCC03C17/3642C03C17/3626C03C17/3634C03C17/3657C03C2217/78C03C2218/154C03C2218/152
Inventor 殷红平
Owner 蚌埠兴科玻璃有限公司
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