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Treatment method for TFT-LCD (thin film transistor liquid crystal display) array substrate copper lead etching wastewater

A processing method and technology for array substrates, which are applied in water/sewage treatment, natural water treatment, heating water/sewage treatment, etc., and can solve problems such as a large number of waste residues, waste salt, secondary pollution, environmental hazards, etc.

Active Publication Date: 2019-10-08
DONGJIANG ENVIRONMENTAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The copper wire on the TFT array substrate is a metal layer circuit, which is made by wet etching process, which will generate a large amount of etching wastewater, which mainly contains copper, hydrogen peroxide, sulfuric acid, phosphoric acid, nitric acid, hydrofluoric acid, ammonia nitrogen, amino Pollutants such as azoles and carboxylic acid compounds are hazardous wastes, and direct discharge will cause great harm to the environment
[0004] The traditional treatment method for TFT-LCD wastewater can make the wastewater discharge up to the standard, but it will produce a large amount of waste residue and waste salt, resulting in secondary pollution, and TFT-LCD wastewater also contains a large amount of valuable components such as copper and sulfuric acid. The wastewater treatment method cannot recycle valuable components in the copper wire etching wastewater of the TFT-LCD array substrate, resulting in a waste of resources

Method used

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  • Treatment method for TFT-LCD (thin film transistor liquid crystal display) array substrate copper lead etching wastewater
  • Treatment method for TFT-LCD (thin film transistor liquid crystal display) array substrate copper lead etching wastewater

Examples

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Embodiment 1

[0082] The treatment process of the TFT-LCD array substrate copper wire etching wastewater of the present embodiment is specifically as follows:

[0083] (1) Catalytic oxidation: add sodium hydroxide solution (concentration is 30wt%) in copper etching waste water and adjust pH to 3, then add 0.5wt% ferrous sulfate catalyst, stir reaction 2h, then add sodium hydroxide solution, until Filter until no precipitation occurs to obtain the first treatment solution.

[0084] (2) Stripping and deamination: Add sodium hydroxide solution to the first treatment liquid in step (1), adjust the pH to 12, be 140 ℃, the steam contact that pressure is 0.5MPa with temperature in the stripping tower, make The temperature of the first treatment liquid is controlled at 70° C., and the gas phase steam is condensed to obtain ammonia water, and the mass fraction of the ammonia water is 10%.

[0085] (3) thermal decomposition of copper precipitation: the same as the conditions of step (2) stripping an...

Embodiment 2

[0090] The treatment process of the TFT-LCD array substrate copper wire etching wastewater of the present embodiment is specifically as follows:

[0091] (1) Catalytic oxidation: Add sodium hydroxide solution (30wt%) to the copper etching wastewater to adjust the pH to 3, then add 2wt% activated carbon-supported iron catalyst, stir for 2 hours, and then filter to obtain the first treatment solution.

[0092] (2) stripping deamination: add sodium hydroxide solution in the first treatment liquid in step (1), adjust pH to 13, be 140 ℃, pressure be the steam contact of 0.5MPa with temperature in the stripping tower, The temperature of the first treatment liquid is controlled at 70° C., and the gas phase steam is condensed to obtain ammonia water, and the mass fraction of ammonia water is 10.4%.

[0093] (3) thermal decomposition of copper precipitation: the same as the conditions of step (2) stripping and deammonization, while the first treatment liquid carried out stripping and d...

Embodiment 3

[0098] The treatment process of the TFT-LCD array substrate copper wire etching wastewater of the present embodiment is specifically as follows:

[0099] (1) Catalytic oxidation: add sodium hydroxide solution (30wt%) to the copper etching wastewater to adjust the pH to 3, then add 1wt% ferrous sulfate, stir and react for 2h, then add sodium hydroxide solution until no precipitation occurs anymore So far, the first treatment liquid is obtained by filtration.

[0100] (2) Stripping and deamination: Add sodium hydroxide solution to the first treatment liquid in step (1), adjust pH to 13, be 140 ℃, pressure be the steam contact of 0.5MPa with temperature in the stripping tower, make The temperature of the first treatment liquid is controlled at 80° C., and the gas phase steam is condensed to obtain ammonia water, and the mass fraction of ammonia water is 12.2%.

[0101] (3) thermal decomposition of copper precipitation: the same as the conditions of step (2) stripping and deammon...

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Abstract

The invention relates to a treatment method for TFT-LCD (thin film transistor liquid crystal display) array substrate copper lead etching wastewater. The treatment method for the TFT-LCD array substrate copper lead etching wastewater comprises the following steps: adding a catalyst into copper etching wastewater to catalyze an oxidation reaction of copper etching wastewater, and removing the catalyst so as to obtain a first treatment liquid; adjusting the pH value of the first treatment liquid to 10-14, performing steam stripping treatment on the first treatment liquid at 40-90 DEG C so as toobtain a steam stripping liquid and ammonium hydroxide, and further filtering the steam stripping liquid so as to obtain a second treatment liquid and copper oxide; adding calcium nitrate and a soluble carbonate into the second treatment liquid in sequence, and further performing solid-liquid separation so as to obtain a third treatment liquid and calcium sulfate; and performing distillation treatment on the third treatment liquid, so as to obtain distillate and a nitrate. By adopting the treatment method of the copper etching wastewater, the treated copper etching wastewater can be directly discharged from containing tubes, and resources in the copper etching wastewater can be recycled and utilized in the treatment process.

Description

technical field [0001] The invention relates to the field of waste water treatment, in particular to a treatment method for etching waste water of copper wires on a TFT-LCD array substrate. Background technique [0002] In recent years, TFT-LCD (Thin Film Transistor Liquid Crystal Display) has been widely used in televisions, computers, handheld terminal equipment, flat-panel displays, and instrumentation due to its advantages of thinness, power saving, and low radiation. TFT-LCD is composed of two glass plates with electrodes and liquid crystal molecules filled in the middle. The upper glass plate is a CF (color filter) substrate, and the lower layer is a TFT array substrate. In order to achieve excellent display performance, copper wires with low resistivity and good electromigration capability are used on the TFT array substrate. [0003] The copper wire on the TFT array substrate is a metal layer circuit, which is made by wet etching process, which will generate a large...

Claims

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Application Information

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IPC IPC(8): C02F9/10C01B21/48C01C1/02C01F11/46C01G3/02C02F101/10C02F101/16C02F101/20C02F103/34
CPCC02F9/00C01G3/02C01F11/46C01C1/022C01B21/48C02F1/722C02F1/725C02F1/66C02F1/001C02F1/5236C02F1/04C02F2101/20C02F2101/101C02F2101/163C02F2101/16C02F2103/346
Inventor 龙江陈露吴文彪
Owner DONGJIANG ENVIRONMENTAL