Displacement Irradiation Resistance Method for Single Crystal Si Solar Cells Based on Substrate Deep Ion Implantation
A technology of ion implantation and solar cells, which is applied in the field of solar cell microelectronics, can solve problems such as radiation defects and solar cell I-V characteristic degradation, and achieve the effect of improving radiation resistance, improving radiation resistance, and maintaining stability
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[0033] Specific implementation mode 1. Combination figure 1 and figure 2 As shown, the present invention provides a method for anti-displacement irradiation of a single crystal Si solar cell based on substrate deep layer ion implantation, comprising the following steps:
[0034] Step 1: According to the structural parameters of the original single crystal Si solar cell, determine the desired implantation position of the ions, and determine the energy and range of the ions according to the desired implantation position;
[0035] Step 2: implant the ions into the original single crystal Si solar cell, simulate the target I-V change curve during the ion implantation process, and record the ion implantation when the change of the target I-V change curve is less than 10% of the original single crystal Si solar cell I-V change curve quantity;
[0036] Step 3: Calculate the ion source voltage, ion beam current and ion implantation time of the ion implanter according to the ion ene...
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