Unlock instant, AI-driven research and patent intelligence for your innovation.

Displacement Irradiation Resistance Method for Single Crystal Si Solar Cells Based on Substrate Deep Ion Implantation

A technology of ion implantation and solar cells, which is applied in the field of solar cell microelectronics, can solve problems such as radiation defects and solar cell I-V characteristic degradation, and achieve the effect of improving radiation resistance, improving radiation resistance, and maintaining stability

Active Publication Date: 2021-04-27
HARBIN INST OF TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the problem that existing solar cells will produce irradiation defects due to the irradiation of charged particles in space, which will further cause the degradation of I-V characteristics of solar cells, the present invention provides a single crystal Si solar cell anti-displacement irradiation method based on deep ion implantation of the substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Displacement Irradiation Resistance Method for Single Crystal Si Solar Cells Based on Substrate Deep Ion Implantation
  • Displacement Irradiation Resistance Method for Single Crystal Si Solar Cells Based on Substrate Deep Ion Implantation
  • Displacement Irradiation Resistance Method for Single Crystal Si Solar Cells Based on Substrate Deep Ion Implantation

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0033] Specific implementation mode 1. Combination figure 1 and figure 2 As shown, the present invention provides a method for anti-displacement irradiation of a single crystal Si solar cell based on substrate deep layer ion implantation, comprising the following steps:

[0034] Step 1: According to the structural parameters of the original single crystal Si solar cell, determine the desired implantation position of the ions, and determine the energy and range of the ions according to the desired implantation position;

[0035] Step 2: implant the ions into the original single crystal Si solar cell, simulate the target I-V change curve during the ion implantation process, and record the ion implantation when the change of the target I-V change curve is less than 10% of the original single crystal Si solar cell I-V change curve quantity;

[0036] Step 3: Calculate the ion source voltage, ion beam current and ion implantation time of the ion implanter according to the ion ene...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for anti-displacement irradiation of a single crystal Si solar cell based on deep-layer ion implantation of a substrate, belonging to the technical field of solar cell microelectronics. The invention aims at the problem that the existing solar cells will produce irradiation defects due to the irradiation of space charged particles, and then cause the degradation of the I-V characteristics of the solar cells. It determines the intended implantation position of ions according to the structural parameters of the original single crystal Si solar cell, and simulates and determines the energy and range of the ions according to the intended implantation position; then simulates the target I‑V change curve during the ion implantation process, when the target I‑V When the amount of change of the change curve is less than 10% of the I-V change curve of the original single crystal Si solar cell, record the ion implantation amount; then calculate the ion source voltage, ion beam current and ion implantation time of the ion implanter; set the ion implanter, for The original single crystal Si solar cell is ion-implanted and annealed to realize the anti-displacement radiation reinforcement of the original single crystal Si solar cell. The invention is used for reinforcement of single crystal Si solar cells.

Description

technical field [0001] The invention relates to a single-crystal Si solar cell anti-displacement irradiation method based on substrate deep layer ion implantation, and belongs to the technical field of solar cell microelectronics. Background technique [0002] Monocrystalline Si solar cells are silicon-based solar cells with the highest photoelectric conversion efficiency. Compared with gallium arsenide (GaAs) solar cells with higher efficiency, they have the advantage of low cost and light weight, so they are widely used in low-cost small spacecraft power systems middle. At present, the preparation technology of monocrystalline silicon solar cells is basically mature, but with the rapid development of the aerospace industry, solar cells will face a more complex space service environment, which requires spacecraft space power systems to have a longer service time. Crystalline silicon solar cells cannot meet the requirements for use. Since the most important environmental f...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCH01L31/18H01L31/186H01L31/1864Y02E10/50Y02P70/50
Inventor 张延清齐春华刘超铭王天琦马国亮陈肇宇王新胜霍明学
Owner HARBIN INST OF TECH