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Diamond growth tray and system

A diamond and tray technology, which is applied in the field of diamond growth trays and systems, can solve problems such as high local plasma density, and achieve the effects of low product stress, growth inhibition, and growth rate reduction

Active Publication Date: 2020-01-21
CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This substrate table design method can effectively suppress the growth of polycrystalline diamond seed crystals at the four sides / corners by avoiding edge discharge and corner discharge, resulting in excessive local plasma density, but the defect of this design is still that it needs multiple times Dealing with impurities grown on the surface of the seed tray

Method used

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  • Diamond growth tray and system
  • Diamond growth tray and system
  • Diamond growth tray and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Please focus on figure 1 , the present invention provides a diamond growth tray, comprising a base 11 and a platform 12 installed on the base 11;

[0036] The platform 12 is in the shape of a regular polygonal prism or a truncated cone, and has a groove 13 on the upper surface, and the edge of the opening of the groove 13 is designed to be chamfered.

[0037] Specifically, during the diamond growth process, the seed crystal is placed inside the groove 13, and the height of the upper surface of the seed crystal is 1-2mm lower than the edge of the concave edge; the diameter of the groove 13 is based on the synthetic single crystal The effective growth area is determined, and the diameter is less than or equal to 155mm; before use, the bottom of the groove 13 is first placed with auxiliary heat dissipation materials, such as filaments, sheets, etc., and the filament sheets are high temperature resistant (that is, can withstand over 1400°C) material, such as molybdenum, ni...

Embodiment 2

[0047] Please focus on figure 2 , the present invention also provides a diamond growth system, including the tray 1, and also includes a water cooling table 2, a tray lifting device 3, a detection device 5, and a control center 4;

[0048] The tray 1 is fixed on the water cooling table 2;

[0049] The water cooling platform 2 is installed on the tray lifting device 3;

[0050] The pallet lifting device 3 is used to control the up and down movement of the pallet 1; specifically, the pallet lifting device 3 includes a pulse motor and a lifting rail, and the water cooling table 2 is installed on the lifting rail to ensure that each time The lifting height is controlled between 0.1-1mm;

[0051] The detection device 5 is used to detect the thickness of the diamond in real time during the diamond growth process, and transmit the thickness data to the control center 4; the detection device 5 is a proximity position sensor;

[0052] The control center 4 is used to control the ope...

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Abstract

The invention relates to the field of diamond manufacturing, in particular to a diamond growth tray and system. The diamond growth tray comprises a base portion and a bearing platform arranged on thebase portion. The bearing platform is in a regular polygon frustum shape or a circular truncated cone shape, a groove is formed in the upper surface of the bearing platform, and the edge of an openingof the groove is designed to be chamfered. Compared with the prior art, the tray has the advantages that through the newly designed seed crystal tray, plasma distribution and electric field distribution on the surface of the seed crystal can be kept in the optimal state, it is guaranteed that the growth environment of the diamond seed crystal is stable, the number of surface growth defects is reduced, and finally a high-quality single crystal diamond piece is synthesized; by means of the newly designed seed crystal tray, the growth rate of impurities such as carbon black on the edge of the seed crystal tray can be remarkably reduced, it is guaranteed that the single stable growth time is longer, thicker products can grow at a time, and the production efficiency is improved.

Description

technical field [0001] The invention relates to the field of diamond manufacturing, in particular to a diamond growth tray and system. Background technique [0002] High-quality diamond has a high band gap and a wide light transmission spectrum. At the same time, it has ultra-high hardness and thermal conductivity, excellent insulation, and excellent physical and chemical properties such as acid resistance, heat resistance, and radiation resistance. It can be used in precision machining. , Optical windows, gemstones, MEMS (Micro-Electro-Mechanical System, Micro-Electro-Mechanical System), chips and other fields. However, high-quality natural diamond reserves are limited, so people have developed a variety of synthetic diamond methods, such as high temperature and high pressure method, hot wire chemical vapor deposition method. Among them, the MPCVD (Microwave plasma chemical vapor deposition, microwave plasma chemical vapor deposition method) synthetic diamond method can th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/04C30B25/12
CPCC30B25/12C30B29/04
Inventor 彭国令黄翀
Owner CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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