Method for high-effectively regulating the dislocation density of local area of CVD monocrystal diamond
A single crystal diamond, local area technology, applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve the problem of inability to locally control the inhomogeneity of the diamond substrate, and achieve the improvement of crystal quality and uniformity, Efficient processing effect
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Embodiment 1
[0039] The method for efficiently controlling the dislocation density in the local area of CVD single crystal diamond has the following steps:
[0040] (1) Detection of dislocation density and distribution in diamond substrates
[0041] a. Domestically produced type Ib HPHT diamond is used as the substrate material, and its size is 3mm×3mm×0.5mm. Use H 2 SO 4 / KNO 3 Mixed solution heat treatment, acetone ultrasonic cleaning, ethanol ultrasonic cleaning, deionized water ultrasonic cleaning and other steps to clean the diamond substrate, the purpose is to remove the residual metal, graphite, organic matter and other pollutants on the surface of the diamond sample;
[0042] b. H for about 1h on the diamond substrate 2 / O 2 (O 2 / H 2 2%) plasma etching treatment;
[0043] c. Use 3D optical profiler, atomic force microscope or differential interference microscope to characterize the etched morphology of the diamond substrate surface, and use an orthogonal polarizing micro...
Embodiment 2
[0058] The method for efficiently controlling the dislocation density in the local area of CVD single crystal diamond has the following steps:
[0059] (1) Detection of dislocation density and distribution in diamond substrates
[0060] a. Domestically produced type Ib HPHT diamond is used as the substrate material, and its size is 3mm×3mm×0.5mm. The diamond substrate is cleaned by aqua regia heat treatment, acetone ultrasonic cleaning, ethanol ultrasonic cleaning, deionized water ultrasonic cleaning and other steps to remove metal, graphite, organic matter and other pollutants remaining on the surface of the diamond sample;
[0061] b. H for about 1h on the diamond substrate 2 / O 2 (O 2 / H 2 2%) plasma etching treatment;
[0062] c. Use 3D optical profiler, atomic force microscope or differential interference microscope to characterize the etched morphology of the diamond substrate surface, and use an orthogonal polarizing microscope system to detect abnormal birefring...
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