Method for manufacturing grating nano-imprinting template by using electron beam lithography technology

Abstract

The invention discloses a method for manufacturing a grating nano-imprinting template by using an electron beam lithography technology, and relates to a method for manufacturing a nano-imprinting template on silicon or glass by using electron beam lithography in combination with inductive coupling plasma etching and reactive ion beam etching technologies. The invention aims to improve the manufacturing process of a template to a nanoscale, improve the stability of the template and the uniformity of a nanostructure, and improve the imprinting quality and precision.

Description

technical field [0001] The invention relates to the technical field of grating nano-imprint templates, in particular to a method for making grating nano-imprint templates using electron beam lithography technology. Background technique [0002] Since nanoimprint technology was proposed in the last century, it is considered to be one of the most promising nano-device manufacturing technologies, which provides the possibility of low-cost manufacturing of large-scale, highly ordered nano-device arrays. At present, due to the uniqueness of this technology, it is also widely used in the research and development of optical devices. In the process of nanoimprinting, the production of the template is the core, and the quality of the template will directly affect the integrity and uniformity of the imprinted structure. In the existing technical solutions, hard materials such as silicon and quartz glass are usually used as the substrate material, and the photoresist spin-coated on th...

AI Technical Summary

Problems solved by technology

In the existing technical solutions, hard materials such as silicon and quartz glass are usually used as the substrate material, and the photoresist spin-coated on the hard substrate is subjected to photolithographic exposure through a mask, and then developed to obtain the desired Structure, or mechanical scribing method, electron beam direct writing exposure, laser direct writing exposure, laser interference exposure, so the template processing time is long, the cost is high, and the price is expensive

[0003] The production of grating templates in the prior art has the following disadvantages: 1. Using the imprint template made by exposing the photoresist requires a separate design of the mask plate, and the structure made is made of organic polymer materials, so the emphasis is not enough. After many times After imprinting, the structure will be damaged, which will affect the structural accuracy of imprinting; 2. During the process of thermal curing, the structure composed of organic polymer materials on the imprinting template will be deformed due to temperature rise, which will affect the imprinting. Printing accuracy; 3. The imprint template made by exposing the photoresist with ultraviolet rays, due to the limitation of photolithography accuracy, can usually achieve micron-level templates, but cannot do nano-scale templates

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