A medicament for removing chlorine ions in polluted acid wastewater, a method for removing chlorine, and its application
A technology of polluted acid wastewater and chloride ions, which is applied in separation methods, water/sewage treatment, chemical instruments and methods, etc., can solve the problem of high cost, restricting the smooth advancement of wastewater treatment and recycling technology of polluted acid wastewater, and a large amount of consumption. question
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0042] A method for removing chloride ions in polluted acid wastewater, comprising: adding 1.47 g of sodium bismuthate dihydrate to 200 mL of polluted acid wastewater whose concentrations of hydrogen ions and chloride ions are respectively 1.02 mol / L and 2471 mg / L, Magnetic stirring at room temperature of 20°C, the stirring frequency is 100r / min, the residual concentration of chloride ions in the polluted acid wastewater after 80 minutes of reaction is 39.5mg / L (measured by the chloride ion selective electrode method), and the removal rate of chloride ions is 98.4% . The chlorine gas generated during the reaction was introduced into a 10mL absorption container containing 9wt% sodium hydroxide solution through the pipeline on the container for absorption to obtain a chlorine gas absorption solution with a concentration of 3.24wt%. The bismuth oxychloride solid product was suction filtered, washed, dried at 60°C for 30 minutes, then added to the above 10mL chlorine gas absorptio...
Embodiment 2
[0044]A method for removing chloride ions in polluted acid wastewater, comprising: adding 2.73 g of sodium bismuthate dihydrate in 400 mL of polluted acid wastewater whose concentrations of hydrogen ions and chloride ions are respectively 0.82 mol / L and 2300 mg / L. Under 20 ℃ of room temperature magnetic stirring, stirring frequency is 150r / min, and the chlorine ion residual concentration in the polluted acid wastewater after reaction 120min is 39.1mg / L (measured with the chloride ion selective electrode method), and the removal rate of chloride ion is 98.3%. The chlorine gas generated during the reaction was passed into a 20mL absorption container containing 10wt% sodium hydroxide solution through the pipeline on the container for absorption to obtain a chlorine gas absorption solution with a concentration of 3.01wt%. The bismuth oxychloride solid product was suction filtered, washed, dried at 60°C for 30 minutes, then added to the above 20mL chlorine gas absorption solution, s...
Embodiment 3
[0046] A method for removing chloride ions in polluted acid wastewater, comprising: adding 2.70 g of sodium bismuthate dihydrate to 400 mL of polluted acid wastewater whose concentrations of hydrogen ions and chloride ions are respectively 0.89 mol / L and 2272 mg / L. Under 30 ℃ of room temperature magnetic stirring, stirring frequency is 150r / min, and the chlorine ion residual concentration in the polluted acid waste water after reacting 90min is 25.0mg / L (measured with the chloride ion selective electrode method), and the removal rate of chloride ion is 98.9%. The chlorine gas generated during the reaction was passed into a 20mL absorption container containing 9wt% sodium hydroxide solution through the pipeline on the container for absorption to obtain a chlorine gas absorption solution with a concentration of 3.00wt%. The bismuth oxychloride solid product was suction filtered, washed, dried at 60°C for 30 minutes, then added to the above 20mL chlorine gas absorption solution, s...
PUM
Property | Measurement | Unit |
---|---|---|
clearance rate | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com