An integrated molding method for fabricating three-dimensional rotationally symmetrical microstructures

Abstract

The invention discloses an integrated molding method for manufacturing a three-dimensional rotationally symmetrical microstructure. According to the central section shape function of the target three-dimensional rotationally symmetrical microstructure (31), the exposure and development model of the photoresist, and the rotational integral model of the exposure dose, Design a two-dimensional mask graphic code, and use laser direct writing technology to make a mask (1); uniformly coat a layer of photoresist (3) on the surface of the substrate (2); adjust the photolithography of the mask and the substrate and its surface The glue is kept strictly parallel when separated by a certain gap; the mask is controlled to perform coaxial rotational movement relative to the substrate according to the set angular velocity, and at the same time, the mask is exposed to the surface by ultraviolet light (4); after development, three-dimensional rotational symmetry is obtained microstructure. Through the joint action of the pattern modulation of the mask and the rotation integration of the exposure energy, a specific continuous exposure dose distribution is formed on the photoresist, and the integrated molding of the three-dimensional rotationally symmetrical microstructure can be realized, which reduces the technical complexity and production cost, and improves Improved machining accuracy and efficiency.

Description

technical field [0001] The invention belongs to the technical field of micro-nano optics, and in particular relates to an integrated molding method for manufacturing three-dimensional rotationally symmetrical microstructures. Background technique [0002] Compared with traditional optical elements, diffractive optical elements have significant advantages in miniaturization, arrayization and integration, and are widely used in various research fields of modern optics. Among them, diffractive optical elements with three-dimensional rotationally symmetric microstructures, such as harmonic diffractive lenses for focusing imaging, cylindrical lens arrays with annular distribution, helical phasers for generating vortex beams, etc., have unique optical properties and excellent optical properties. Quality has become a research hotspot in recent years. [0003] Existing preparation technologies for three-dimensional rotationally symmetric microstructures, such as multi-layer mask ov...

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Problems solved by technology

[0003] Existing preparation technologies for three-dimensional rotationally symmetric microstructures, such as multi-layer mask overlay exposure technology, require multiple mask alignment exposures and ion beam etching processes to approximate the surface shape of a curved surface, and the process flow is complex and Low processing efficiency; laser direct writing grayscale exposure technology, using single-point exposure to complete the grayscale exposure process, the processing cycle is extremely long, and the processing equipment is very expensive

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