An integrated conformal manufacturing method for a multilayer interconnected three-dimensional circuit
A technology of three-dimensional circuit and manufacturing method, which is applied in the direction of processing and manufacturing, radiation element structure, additive processing, etc., to achieve the effect of improving design freedom, promoting intelligent process, and improving integration
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Embodiment 1
[0075] Example 1: Preparation method of PEEK-based conformal antenna
[0076] (1) Use fused deposition (FDM) equipment to print the PEEK antenna support structure matrix. The PEEK raw material is a wire material with a diameter of 1.75mm. The printing temperature is 380-430°C, the printing line speed is 80-120mm / s, and the support structure matrix needs to be 100%. filling. The tensile strength of the support structure matrix is above 95MPa, the bending strength is above 140MPa, the tensile modulus is 4GPa, and the bending modulus is 3.7GPa. The thickness of the supporting structure matrix is 3 mm, and the diameter of the projected area of the electronic component is more than 200 mm.
[0077] (2) Prepare a feeding hole with a diameter of 300 μm on the PEEK support structure substrate by laser drilling, use a sweeping machine to reduce the surface roughness of the dielectric layer to Sa=3.2 μm, and use a microetching solution to integrate the dielectric structure deal ...
Embodiment 2
[0085] Example 2: Preparation method of aluminum alloy cold plate-based antenna
[0086] (1) The curved surface cold plate is prepared according to the design by laser selective melting (SLM), the aluminum alloy material is 2A21, the inner flow channel diameter of the cold plate is 3 mm, and the plate thickness is 5 mm.
[0087] (2) Prepare an insulating medium layer on the surface of the cold plate by using a micro-pen system. The material is a thermosetting polyimide solution, and the polyimide solution is irradiated with an infrared lamp, and is cured under a temperature gradient below 180°C.
[0088] (3) Microetching the surface of the polyimide dielectric layer, and then preparing a solid film containing palladium ions on the surface.
[0089] (4) Use 1064nm nanosecond laser to scan according to the preset path. The laser parameters are pulse width 10ns, repetition frequency 50KHz, scanning speed 1500-2000mm / s, laser peak power 30w, and selectively activate palladium-con...
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