The invention discloses an antenna preparation method which replaces the
laser direct forming technology. The matrix sample enters the preparation room through a
conveyor belt, and a
drying system is installed in the preparation room to ensure the cleanness and
drying of the sample; the matrix sample enters the pre-extraction room through the
conveyor belt after
drying; After the gas is completed, it enters the buffer chamber through the
conveyor belt, and the buffer chamber is subjected to high
vacuum pumping by a molecular pump; finally enters the
processing chamber, where high-energy
ion implantation and low-energy
ion beam deposition operations are performed, and finally samples are collected to complete the
processing process. The invention provides an antenna preparation method that replaces the
laser direct forming technology. The method is based on high-energy
ion beam technology, low-energy
ion beam technology and related
mask technology to form a
metal antenna with certain functions. The antenna prepared by the method has the characteristics of low cost, no need for
laser powder, good
corrosion resistance, high
bonding strength, good film consistency, low
surface roughness, and
environmental protection.