Surface-enhanced Raman scattering substrate and preparation method and application thereof

A surface-enhanced Raman and substrate technology, applied in the direction of Raman scattering, measuring devices, instruments, etc., can solve the problems of poor manufacturability, sensitivity, poor uniformity and stability, inconvenient portability, etc., and achieve the effect of high Raman enhanced performance

Pending Publication Date: 2020-09-11
绍兴镭纳激光科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the commonly used SERS substrates mainly include nanoparticle sol substrates and substrate substrates. Nanoparticle sol substrates are usually prepared by chemical reduction method with a sensitivity of 10 -6 ~10 -9 mol / L, but it is not easy to carry, and the uniformity, consistency and stability are poor; substrate substrates are commonly used in photolithography (electron beam etching, nanoimprint lithography, etc.), template methods (electrochemical deposition, physical vapor phase deposition, etc.) and direct induction molding (oblique angle deposition, wet etching, etc.) preparation methods, in which photolithography and template methods have high sensitivity and good uniformity, but the preparation process is complicated, costly, and poor in manufacturability; direct induction The process is simple, but the sensitivity, uniformity and stability are poor
At present, common commercial SERS substrates include gold sol, silver sol, Ocean Optics, Klarite, Q-SERS and Silmeco, etc., which are expensive, and the uniformity and stability need to be improved.
To sum up, the simple and controllable preparation of SERS substrates with high sensitivity and uniformity, stability, practicability and manufacturability is still a great challenge, which seriously restricts the application of SERS and is the current bottleneck problem.

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  • Surface-enhanced Raman scattering substrate and preparation method and application thereof
  • Surface-enhanced Raman scattering substrate and preparation method and application thereof
  • Surface-enhanced Raman scattering substrate and preparation method and application thereof

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preparation example Construction

[0034] The present invention also provides a method for preparing the surface-enhanced Raman scattering substrate, comprising the following steps:

[0035] (1) Use a laser to scan the base material in point form to form a three-dimensional self-supporting micro-nano composite multilevel structure; the laser is a femtosecond laser or a picosecond laser; the base material is a transition metal;

[0036] (2) Washing, purging, and drying the obtained three-dimensional self-supporting micro-nano composite multi-level structure in sequence to obtain the surface-enhanced Raman scattering substrate.

[0037] In the present invention, the base material is preferably processed before spot scanning, and the processing is preferably sequential grinding, cleaning and purging, and the grinding is preferably performed with sandpaper, and the mesh number of the sandpaper is It is preferably 200 mesh, 500 mesh, 1000 mesh and 1200 mesh. The order of grinding is preferably from low mesh to high ...

Embodiment 1

[0048] A surface-enhanced Raman scattering substrate and its preparation method

[0049] Pre-treatment: Cut the copper block, the size is 10×10×2.5mm 3 , using 200-mesh, 500-mesh, 1000-mesh and 1200-mesh sandpaper to polish sequentially. The grinding time of each kind of sandpaper is 1 minute. The polished copper block is soaked in ethanol for 5 minutes and the ultrasonic frequency is 53KHz. After the ultrasonic is finished, Nitrogen was purged at a pressure of 0.1 MPa for 5 min to obtain a dry copper substrate.

[0050] A femtosecond laser is used to ablate the surface of the copper substrate. The laser wavelength is 1030nm, the pulse width is 800fs, the pulse repetition frequency is 200kHz, the average power is 10W, and the scan time is 30s, and the scan interval is 50μm. , to get the intermediate sample;

[0051] After washing the intermediate sample with ethanol, purging with nitrogen, the purging pressure is 0.1 MPa, and the purging time is 5 minutes. After purging, it ...

Embodiment 2

[0060] A surface-enhanced Raman scattering substrate and its preparation method

[0061] Cut the silver sheet to size 10×10×0.1mm 3 small pieces of matrix;

[0062] A femtosecond laser is used to ablate the surface of the silver substrate, wherein the laser wavelength is 532nm, the pulse width is 300fs, the pulse repetition frequency is 600kHz, the average power is 20W, and the scanning time is 30s, and the scanning interval is 50μm. , to get the intermediate sample;

[0063] After washing the intermediate sample with ethanol, purging with nitrogen, the purging pressure is 0.1 MPa, and the purging time is 5 minutes. After purging, it is dried at 100° C. for 15 minutes to obtain a silver surface-enhanced Raman scattering substrate.

[0064] The surface-enhanced Raman scattering substrate prepared in this application has a micro-pit array period of 50 μm and a micro-pit depth of 10 μm. The surface scanning picture is shown in Figure 7; the substrate prepared in this example ha...

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Abstract

The invention belongs to the technical field of surface-enhanced Raman scattering spectrum analysis. The invention provides a surface-enhanced Raman scattering substrate, and the surface of the surface-enhanced Raman scattering substrate provided by the invention is provided with a multi-stage three-dimensional self-supporting structure of micron pits, nanobelts, nano bulges, nano ripples and nanoparticles. According to the surface-enhanced Raman scattering substrate and the preparation method thereof, by controlling laser processing parameters and scanning parameters, controllable preparation of the micro-nano structure on the surface of the material can be achieved, the surface enhanced Raman scattering effect is further improved, the preparation process is simple and practical, and thesurface enhanced Raman scattering substrate and the preparation method thereof are suitable for batch preparation. The invention also provides application of the surface-enhanced Raman scattering substrate in surface enhanced Raman scattering, and the surface-enhanced Raman scattering substrate provided by the invention has high sensitivity, excellent uniformity and stability, and can be appliedto most detection fields.

Description

technical field [0001] The invention relates to the technical field of surface-enhanced Raman scattering spectroscopy, in particular to a surface-enhanced Raman scattering substrate and a preparation method and application thereof. Background technique [0002] Surface-enhanced Raman scattering (SERS) means that on the surface or sol of a specially prepared noble metal nanostructure substrate (or SERS chip), the Raman scattering signal of adsorbed molecules is larger than that of ordinary Raman due to the enhanced electromagnetic field on the surface or near the surface. Scattering (NRS) signal is greatly enhanced. SERS has extremely high detection sensitivity, can provide very specific biomolecular "fingerprint" information, and can even realize single-molecule detection. It is especially suitable for high-throughput and rapid detection of various molecules. Ultrasensitive detection research. [0003] The main mechanism of SERS enhancement is electromagnetic field enhancem...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 不公告发明人
Owner 绍兴镭纳激光科技有限公司
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