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Urethane resin and polishing pad using polyrotaxane

A urethane, polyrotaxane technology, applied in the field of polishing pads, to achieve the effects of low hysteresis loss, low scratch resistance, and excellent polishing characteristics

Active Publication Date: 2022-04-22
TOKUYAMA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The thermoplastic resin described in this patent document 4 contains a polyrotaxane to improve the mechanical properties of the thermoplastic polyurethane resin, but simply mixing the polyrotaxane and the thermoplastic polyurethane is not enough from the viewpoint of satisfying high wear resistance. room for improvement

Method used

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  • Urethane resin and polishing pad using polyrotaxane
  • Urethane resin and polishing pad using polyrotaxane
  • Urethane resin and polishing pad using polyrotaxane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0308] Next, the present invention will be described in detail using examples and comparative examples, but the present invention is not limited to these examples. In the following examples and comparative examples, evaluation methods and the like are as follows.

[0309] (Polyrotaxane (A) used)

[0310] RX-1: a polyrotaxane having a side chain having a hydroxyl group, an average molecular weight of about 350, a weight average molecular weight of 200,000, and a hydroxyl value of 87 mgKOH / g.

[0311] RX-2: A polyrotaxane having a side chain having a hydroxyl group, having a molecular weight average of about 650, a weight average molecular weight of 350,000, and a hydroxyl value of 55 mgKOH / g.

[0312] From the value of the hydroxyl value, the total number of moles (ns2) of active hydrogen-containing groups in the side chain of the polyrotaxane (A) can be calculated

[0313] (Molecular weight measurement: gel permeation chromatography (GPC measurement))

[0314] For the measu...

manufacture example

[0318] Manufacturing example (manufacturing of RX-1)

[0319] (1-1) Preparation of PEG-COOH:

[0320] Linear polyethylene glycol (PEG) with a molecular weight of 10,000 was prepared as a polymer for forming the shaft molecule.

[0321] Prepare the following prescriptions:

[0322] PEG 10g

[0323] TEMPO (2,2,6,6-tetramethyl-1-piperidinyloxy radical) 100mg

[0324] Sodium Bromide 1g,

[0325] The ingredients were dissolved in 100 mL of water. To this solution, 5 mL of a commercially available sodium hypochlorite aqueous solution (5% available chlorine concentration) was added, followed by stirring at room temperature for 10 minutes. Then, ethanol was added in a range of up to 5 mL to terminate the reaction. Then, 50 mL of dichloromethane was used for extraction, and then the dichloromethane was distilled off, dissolved in 250 mL of ethanol, and then reprecipitated at a temperature of -4° C. for 12 hours to recover dry PEG-COOH.

[0326] (1-2) Preparation of polyrotaxane:...

manufacture example P

[0363] Production example of production example Pre-1

[0364] In a flask equipped with a nitrogen introduction tube, a thermometer, and a stirrer, 50 g of 2,4-toluene diisocyanate, 32 g of polyoxytetramethylene glycol (number average molecular weight: 1000) and 1,4-butylene were mixed under a nitrogen atmosphere. 10 g of diol was reacted at 80°C for 8 hours to obtain an isocyanate-terminated urethane prepolymer having an iso(thio)cyanate equivalent of 319 (pre-1 was obtained).

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Abstract

The present invention relates to a urethane resin obtained by reacting a polymerizable composition containing at least the following components: a bifunctional active hydrogen-containing compound (C1) having two active hydrogen-containing groups in the molecule and A carbamate having an iso(thio)cyanate group at the end of the molecule obtained by reacting a bifunctional iso(thio)cyanate group-containing compound (B1) having two iso(thio)cyanate groups in the molecule A prepolymer (B2); having a composite molecular structure formed of an axis molecule and a plurality of ring molecules encapsulating the axis molecule, and introducing a side chain having an active hydrogen group into at least a part of the ring molecule a polyrotaxane (A); and a polyfunctional active hydrogen-containing compound (C2) other than the polyrotaxane (A) having three or more active hydrogen-containing groups in a molecule. According to the present invention, it is possible to provide a urethane resin for sliding parts having high wear resistance, which can be suitably used as a buffing pad.

Description

technical field [0001] This invention relates to novel urethane resins. Specifically, it relates to a new urethane resin obtained by polymerizing a specific polymerizable monomer component, and a new polishing pad containing the urethane resin. Background technique [0002] The polishing member refers to a member used for flattening a counterpart member with a polishing agent. Specifically, the polishing member refers to a member that is used when a polishing agent such as a slurry is supplied to the surface while the polishing agent is brought into sliding contact with the surface when the surface of the member to be polished is planarized. Examples include polishing pads. [0003] Urethane resins are often used for such polishing members. In general, as a polishing member, from the viewpoint of cost reduction, stable production, and improvement in productivity, a highly durable material with good long-term wear resistance is always desired. [0004] The polishing membe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G18/64C08G18/10B24B37/24C08J5/14
CPCB24B37/24C08G18/12C08G18/7621C08G18/4854C08G18/3206C08G18/3243C08G18/3857C08G18/6484C08G18/6674C08L75/04C08G18/3814C08G18/64C08G18/10C08G83/007C08L87/005C08K7/22
Inventor 清水康智川崎刚美户知光喜
Owner TOKUYAMA CORP
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