Supercharge Your Innovation With Domain-Expert AI Agents!

P-type semiconductor graphite and preparation method thereof

A semiconductor and graphite technology, which is applied in the field of P-type semiconductor graphite and its preparation, can solve the problems of poor corrosion resistance and achieve the effects of improving hardness and corrosion resistance, good stability, and improving corrosion resistance

Inactive Publication Date: 2020-12-01
DATONG XINCHENG NEW MATERIAL CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the shortcoming of the poor corrosion resistance of P-type semiconductor graphite in the prior art, and propose a kind of P-type semiconductor graphite and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • P-type semiconductor graphite and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] The present invention proposes a P-type semiconductor graphite and a preparation method thereof, including the following raw materials in parts by weight: copper foil, 10 parts of methane, 10 parts of hydrogen gas, 15 parts of boron source gas, 5 parts of polytetrafluoroethylene, and 5 parts of silicon dioxide. 1 part, 1 part of titanium dioxide, 1 part of aluminum oxide, 5 parts of polyurethane;

[0033] Its preparation method comprises the following steps:

[0034] S1: Put the copper foil in the reactor, evacuate, and pass through the argon protective gas, hydrogen and methane, and react for 5 minutes to form a part of the graphene film;

[0035] S2: Then pass the mixed gas of boron source gas and hydrogen into the reactor, and react for 10-30min to obtain boron-doped P-type semiconductor graphene;

[0036] S3: Put polytetrafluoroethylene, silicon dioxide, titanium dioxide, aluminum oxide, and polyurethane into the mixing equipment, stir and mix, the stirring speed i...

Embodiment 2

[0039] The present invention proposes a P-type semiconductor graphite and a preparation method thereof, including the following raw materials in parts by weight: copper foil, 12 parts of methane, 12 parts of hydrogen gas, 17 parts of boron source gas, 7 parts of polytetrafluoroethylene, and 7 parts of silicon dioxide. 3 parts of titanium dioxide, 3 parts of aluminum oxide, 7 parts of polyurethane;

[0040] Its preparation method comprises the following steps:

[0041] S1: Put the copper foil in the reactor, evacuate, and pass through the argon protective gas, hydrogen and methane, and react for 10 minutes to form a part of the graphene film;

[0042] S2: Then pass the mixed gas of boron source gas and hydrogen into the reactor, and react for 20 minutes to obtain boron-doped P-type semiconductor graphene;

[0043] S3: Put polytetrafluoroethylene, silicon dioxide, titanium dioxide, aluminum oxide, and polyurethane into the mixing equipment, stir and mix, the stirring speed is 3...

Embodiment 3

[0046] The present invention proposes a P-type semiconductor graphite and a preparation method thereof, comprising the following raw materials in parts by weight: copper foil, 15 parts of methane, 15 parts of hydrogen gas, 20 parts of boron source gas, 10 parts of polytetrafluoroethylene, and 10 parts of silicon dioxide. 5 parts of titanium dioxide, 5 parts of aluminum oxide, 10 parts of polyurethane;

[0047] Its preparation method comprises the following steps:

[0048] S1: Put the copper foil in the reactor, evacuate, and pass through the argon protective gas, hydrogen and methane, and react for 20 minutes to form a part of the graphene film;

[0049] S2: Then pass the mixed gas of boron source gas and hydrogen into the reactor, and react for 30 minutes to obtain boron-doped P-type semiconductor graphene;

[0050] S3: Put polytetrafluoroethylene, silicon dioxide, titanium dioxide, aluminum oxide, and polyurethane into the mixing equipment, stir and mix, the stirring speed ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of semiconductor graphite preparation, and particularly relates to P-type semiconductor graphite and a preparation method thereof. For solving the problem that existing P-type semiconductor graphite is poor in corrosion resistance, the following scheme is proposed currently, specifically, the P-type semiconductor graphite is prepared from the following raw materials in parts by weight: copper foil, 10-15 parts of methane, 10-15 parts of hydrogen, 15-20 parts of boron source gas, 5-10 parts of polytetrafluoroethylene, 5-10 parts of silicon dioxide, 1-5 parts of titanium dioxide, 1-5 parts of aluminum oxide and 5-10 parts of polyurethane. The preparation method of the P-type semiconductor graphite comprises the following steps: S1, the copper foil is put into a reactor, vacuumizing is performed, argon protective gas is introduced, and the hydrogen and the methane are introduced to react for 5-20 min so as to form a part of graphene film; and S2, mixed gas of the boron source gas and the hydrogen is introduced into the reactor to react for 10-30 min. According to the P-type semiconductor graphite and the preparation method thereof, the corrosion resistance of the P-type semiconductor graphite can be improved, and the preparation method is simple.

Description

technical field [0001] The invention relates to the field of semiconductor graphite preparation, in particular to a P-type semiconductor graphite and a preparation method thereof. Background technique [0002] Hole-type semiconductors, also known as P-type semiconductors, are semiconductors dominated by positively charged holes. Doping a small amount of trivalent element indium or aluminum into pure silicon, because there are 3 valence electrons around the indium or aluminum atom, when forming a covalent bond with the surrounding 4-valent silicon atom, it lacks an electron and forms a hole. Holes act as positively charged particles and play a major role in the conduction of these semiconductors. [0003] The existing P-type semiconductor graphite has poor corrosion resistance, so we propose a P-type semiconductor graphite and its preparation method to solve the above problems. Contents of the invention [0004] The purpose of the present invention is to solve the shortco...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C16/26C23C16/56C01B32/186C01B32/194C09D127/18C09D175/04C09D7/61C09D5/08
CPCC23C16/26C23C16/56C01B32/186C01B32/194C09D127/18C09D175/04C09D7/61C09D5/08C08K2003/2241C08K2003/2227C08L2201/08
Inventor 王志辉张培林武建军柴利春张作文
Owner DATONG XINCHENG NEW MATERIAL CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com