Method for plating surface layer of diamond powder with non-magnetic metal
A diamond powder and non-magnetic metal technology, applied in the field of materials, can solve problems such as difficult uniform coating and inability to accurately control the thickness of the film layer, and achieve the effect of high film purity, less pores and uniform film layer
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Embodiment 1
[0029] A method for coating non-magnetic metal on the surface of diamond powder, the specific operation is as follows: a micro-powder magnetron coating system is used, a 3-inch Mo target is installed with a permanent magnet target head, a DC power supply is turned on, the diamond powder is placed in a coating chamber, and the The coating chamber is evacuated to 3.2×10 -4 Pa, clean the diamond with a 100kV ion source for 30 minutes; then set the parameters of the magnetron sputtering method as follows: the working atmosphere is Ar, the flow rate of Ar is 20sccm, and the working pressure is 3.2×10 -4 Pa, the power of magnetron sputtering is 200W, the current of magnetron sputtering is 595mA, the voltage of magnetron sputtering is 336V; the time of sputtering is 30min, and the temperature of vacuum chamber heating is 25°C. The film is coated until the thickness of the coating is 0.04-0.06 μm, and the diamond powder material with molybdenum coating on the surface is prepared.
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Embodiment 2
[0032] A method for coating non-magnetic metal on the surface of diamond powder, the specific operation is as follows: a micro-powder magnetron coating system is used, a 3-inch Mo target is installed with a permanent magnet target head, a DC power supply is turned on, the diamond powder is placed in a coating chamber, and the The coating chamber is evacuated to 7.2×10 -4 Pa, clean the diamond with a 100kV ion source for 30 minutes; then set the parameters of the magnetron sputtering method as follows: the working atmosphere is Ar, the flow rate of Ar is 20sccm, and the working pressure is 7.2×10 -4 Pa, the power of magnetron sputtering is 200W, the current of magnetron sputtering is 634mA, the voltage of magnetron sputtering is 318V; the time of sputtering is 50min, and the temperature of vacuum chamber heating is 30°C. The film is coated until the thickness of the coating is 0.04-0.06 μm, and the diamond powder material with molybdenum coating on the surface is prepared.
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Embodiment 3
[0035] A method for coating non-magnetic metal on the surface of diamond powder, the specific operation is as follows: a micro-powder magnetron coating system is used, a 3-inch Mo target is installed with a permanent magnet target head, a DC power supply is turned on, the diamond powder is placed in a coating chamber, and the The coating chamber is evacuated to 5.2×10 -4 Pa, clean the diamond with a 150kV ion source for 30 minutes; then set the parameters of the magnetron sputtering method as follows: the working atmosphere is Ar, the flow rate of Ar is 20sccm, and the working pressure is 5.2×10 -4 Pa, the power of magnetron sputtering is 200W, the current of magnetron sputtering is 633mA, the voltage of magnetron sputtering is 315V; the time of sputtering is 70min, and the temperature of vacuum chamber heating is 30°C. The film is coated until the thickness of the coating is 0.04-0.06 μm, and the diamond powder material with molybdenum coating on the surface is prepared.
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