Indium-doped barium-titanate material and its preparation method
A technology of indium-doped barium titanate and barium indium titanate, applied in the field of materials, can solve the problems that no one has developed P-type BaTiO3
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Embodiment 1
[0034] Select the chemical formula (2), select x=0.2, and prepare a composite block with a thickness of Φ30mm and a thickness of about 4mm. In an air atmosphere, sinter at a temperature of 600-900°C for 15 hours. A total of 3 times of crushing and grinding-pressing molding-sintering, and finally sintering at a temperature of 1200°C for 48 hours. BaIn 0.2 Ti 0.8 o 3 blocks. Choose this block as the target, choose 10mm×10mm×0.5mm SrTiO 3 As the substrate, use laser molecular beam epitaxy at a substrate temperature of 620°C and an oxygen pressure of 1×10 -4 Under the condition of Pa, BaIn with a film thickness of 5000 mm was prepared 0.2 Ti 0.8 o 3 film.
[0035] High-energy electron diffraction and X-ray diffraction prove that the prepared P-type BaIn x Ti 1-x o 3 The film is a c-oriented single crystal film with a very good epitaxial single crystal phase. The resistivity of the film measured by the standard four-probe method reaches 10 -5 Ω cm, P-type carrier conc...
Embodiment 2
[0037] Make according to embodiment 1, select chemical formula (1) for use, choose x=0.005, prepare composite block material, before raw material is mixed, earlier BaCO 3 Decarburization was carried out under an oxygen atmosphere at a temperature of 850°C for 20 hours to prepare a block.
[0038] Select this block as a target to prepare BaIn with a film thickness of 2000 mm 0.005 Ti 0.995 o 3 film.
Embodiment 3
[0040] Make by embodiment 1, use pulsed laser deposition, under substrate temperature 700 ℃, oxygen pressure 20Pa condition, prepare the BaI of film thickness 4000mm 0.2 Ti 0.8 o 3 film.
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