A silicon nanowire-based gas sensor element and its preparation method and application in detecting acetone
A gas sensor, silicon nanowire technology, applied in chemical instruments and methods, nanotechnology, nanotechnology and other directions, can solve the problems of infection with other diseases, patient discomfort, diabetes and other problems, and achieve simple preparation process, high process repeatability, low cost effect
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Embodiment 1
[0039] (1) Cleaning of single crystal P-type silicon wafer
[0040] Soak a silicon wafer with a size of 2*2cm in a mixed solution of concentrated sulfuric acid and hydrogen peroxide with a volume ratio of 3:1 for 40 minutes to remove metal impurities on the surface, and then soak it in a HF solution and deionized water with a volume ratio of 1:1 for 10 minutes Remove SiO formed on the surface 2 , and finally ultrasonically cleaned in acetone solvent, absolute ethanol, and deionized water for 10 minutes, respectively, to remove surface oil and organic impurities, and placed in a vacuum drying oven for thorough drying.
[0041] (2) Configure chemical etching solution
[0042] Take 1M hydrofluoric acid in a polytetrafluoroethylene beaker and let it stand for use.
[0043] Take hydrofluoric acid (uniformly dispersed in water) in a polytetrafluoroethylene beaker, weigh the AgNO 3 And dissolved in the above hydrofluoric acid, let it stand for 5min, so that AgNO 3 Fully dissolve...
Embodiment 2
[0054] The difference between this example and Example 1 is that in step (5), the dried Ag nanoparticle-modified nanowires were placed in a 20% volume fraction of APTES ethanol solution and heated in a water bath at 60° C. for 15 minutes.
Embodiment 3
[0056] The difference between this example and Example 1 is that in step (5), the dried Ag nanoparticle-modified nanowires were placed in a 10% volume fraction of APTES ethanol solution and heated in a water bath at 70° C. for 30 minutes.
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