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Method for producing organic solvent solution of quaternary ammonium hydroxide

A technology of quaternary ammonium hydroxide and organic solvent, which is applied in the field of semiconductor manufacturing treatment liquid composition and its manufacturing, and can solve the problems such as not easy to remove

Active Publication Date: 2021-05-04
TOKUYAMA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Modified photoresist with a hard shell formed on the surface is not easy to remove with conventional quaternary ammonium hydroxide aqueous solution
In addition, the ashing residue of the photoresist pattern is also similar to carbon, and it is not easy to remove it with the conventional quaternary ammonium hydroxide solution.

Method used

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  • Method for producing organic solvent solution of quaternary ammonium hydroxide
  • Method for producing organic solvent solution of quaternary ammonium hydroxide
  • Method for producing organic solvent solution of quaternary ammonium hydroxide

Examples

Experimental program
Comparison scheme
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Embodiment

[0248] Hereinafter, the present invention will be described in more detail using examples and comparative examples. However, the following examples are merely examples for explaining the present invention, and the present invention is not limited to these examples.

[0249] (test methods)

[0250] In Examples and Comparative Examples, the concentration of the quaternary ammonium hydroxide in the solution was measured by potentiometric titration using a potentiometric automatic titration device AT-610 (manufactured by Kyoto Denshi Kogyo Co., Ltd.).

[0251] The amount of moisture in the resulting solution was obtained by correcting the value measured by Karl Fischer titration using a calibration curve. The measurement of the water content by Karl Fischer titration was performed using a Karl Fischer moisture meter MKA-510 (manufactured by Kyoto Denshi Kogyo Co., Ltd.). The measurement of the water content by gas chromatography (hereinafter sometimes referred to as "GC") uses a...

Embodiment 1

[0282] By using apparatus A (thin film distillation apparatus 10A ( figure 1 )) to perform thin film distillation (step (a)), thereby producing an organic solvent solution of quaternary ammonium hydroxide.

[0283] The pipes of the device were disassembled, cleaned and assembled in advance, and cleaned by alternately flowing twice each of TMAH aqueous solution having a TMAH concentration of 25% by mass and ultrapure water (step (b)).

[0284]A raw material mixture prepared by mixing 4 kg of 25% by mass TMAH aqueous solution and 16 kg of PG in a clean bucket made of PE was put into a raw material container made of PE (the mixing mass ratio of aqueous TMAH / PG=1 / 4). The temperature of the raw material mixture just before being dropped into the distillation vessel is 23°C, the temperature (heat medium temperature) of the heating surface of the evaporation vessel is 100°C, the degree of vacuum is 600Pa, and the feed rate is 10.0kg / hour (the temperature of the heating surface) Fee...

Embodiment 2

[0286] Use device A (thin film distillation device 10A ( figure 1 )) and perform the same device cleaning as in Example 1 (step (b)), and then perform thin-film distillation (step (a)), thereby producing an organic solvent solution of quaternary ammonium hydroxide.

[0287] A raw material mixture prepared by mixing 4 kg of 25% by mass TMAH aqueous solution and 16 kg of PG in a clean bucket made of PE was put into a raw material container made of PE (the mixing mass ratio of aqueous TMAH / PG=1 / 4). The temperature of the raw material mixture just before being dropped into the distillation vessel is 23° C., the temperature (heat medium temperature) of the heating surface of the evaporation vessel is 105° C., the degree of vacuum is 500 Pa, and the feed rate is 7.0 kg / hour (heating surface temperature). Feed rate per unit area: 70kg / h m 2 ) under the conditions of thin film distillation, thus obtaining a PG solution (about 4 kg) containing TMAH in the residue liquid recovery cont...

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Abstract

According to the present invention, a processing liquid composition for manufacturing a semiconductor is characterized by comprising a quaternary ammonium hydroxide, and a first organic solvent that dissolves the quaternary ammonium hydroxide, wherein: the first organic solvent is a water-soluble organic solvent that has multiple hydroxyl groups, the water content in the composition is 1.0 mass % or less with respect to the total mass of the composition; the contents of Na, Mg, Al, K, Ca, Ti, Cr, Mn, Fe, Ni, Cu, and Zn in the composition are each 100 mass ppb or less with respect to the total mass of the composition; and the content of Cl in the composition is 100 mass ppb or less with respect to the total mass of the composition.

Description

technical field [0001] The present invention relates to a method for producing an organic solvent solution of quaternary ammonium hydroxide, a treatment liquid composition for semiconductor production, and a method for producing the same. Background technique [0002] Solutions containing quaternary ammonium hydroxide are used as photoresist (sometimes simply referred to as "resist") developer, modified photoresist (such as , photoresist after ion implantation process, photoresist after ashing, etc.) stripping solution and cleaning solution, silicon etching solution, etc. [0003] For example, in the development process of photoresist, by coating on the surface of the substrate, for example, a negative or positive photoresist containing a resin such as novolak resin or polystyrene resin, the substrate for pattern formation is interposed. The photomask irradiates light to the coated photoresist, so that the photoresist irradiated by light is cured or soluble, and the uncured...

Claims

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Application Information

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IPC IPC(8): C07C209/84B01D3/10C07C209/86C07C211/63G03F7/32G03F7/42
CPCB01D3/10C07C209/86C07C211/63G03F7/32G03F7/42G03F7/322G03F7/425G03F7/2043C07C209/84
Inventor 橘昇二东野诚司石津澄人山下义晶
Owner TOKUYAMA CORP