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Preparation method of high-purity optical coating material silicon dioxide

An optical coating and silicon dioxide technology, which is applied in the direction of silicon dioxide, silicon oxide, chemical instruments and methods, etc., can solve the problems of large consumption of coal and natural gas, great difference in impurity content, and difficulty in guaranteeing the purity of high-purity ultra-fine quartz powder. , to achieve the effect of less manpower, high work efficiency and reasonable process structure design

Inactive Publication Date: 2021-05-14
江苏微纳光膜科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the grades of raw quartz ore vary greatly across the country, and the content of impurities varies greatly. The purity of high-purity ultra-fine quartz powder produced by traditional techniques is not easy to guarantee.
At the same time, the processing of quartz products is also known as a large energy consumer. In the traditional process, a large amount of electric energy and heat energy are required, which requires a large amount of coal and natural gas consumption.

Method used

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  • Preparation method of high-purity optical coating material silicon dioxide
  • Preparation method of high-purity optical coating material silicon dioxide
  • Preparation method of high-purity optical coating material silicon dioxide

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Embodiment

[0090] like figure 1 The production line of high-purity optical coated silica shown includes primary crushing unit 1, conveyor belt unit 1, secondary crushing unit 3, conveying unit 2 4, primary magnetic separation unit 5, and magnetic separation conveying unit 3 6 , transfer unit 7, conveyor belt unit four 8, cleaning unit 9, three-stage vibrating magnetic separation unit 10, conveyor belt unit five 11 and drying unit 12, the primary crushing unit 1, conveyor belt unit one 2, two-stage Crushing unit 3, conveying unit 2 4, primary magnetic separation unit 5, magnetic separation conveying unit 3 6, transfer unit 7, conveyor belt unit 4 8, cleaning unit 9, tertiary vibration magnetic separation unit 10, conveyor belt unit 5 11 and drying unit 12 are arranged in sequence according to the production process.

[0091] like Figure 2-6The primary crushing unit 1 shown includes a primary quartz feed port 101, a quartz feed box 102, a stirring assembly 103, a primary quartz crushing...

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Abstract

The invention discloses a preparation method of a high-purity optical coating material silicon dioxide. The preparation method comprises the following steps of coarse crushing, conveying, fine crushing, conveying, first-stage magnetic separation, second-stage magnetic separation, conveying belt conveying, transferring, conveying, cleaning, third-stage magnetic separation, conveying and drying. According to the preparation method of the high-purity optical coating material silicon dioxide, a quartz raw material is fed into a high-precision intelligent magnetic separator after being subjected to first-stage crushing and second-stage fine crushing, the quartz raw material passes through the magnetic separator for three times, metal-containing particles in waste quartz particles are adsorbed and discharged through a strong magnetic field in the magnetic separator, high-purity water is used for cleaning, floating objects are removed, after cleaning, the quartz particles are fed into a drying box, and high-purity silicon dioxide can be obtained through reasonable procedure setting. The production process is high in automation degree, high in working efficiency and flexible in application; and the working method and the working principle of the production process are simple and easy to implement, less manpower is needed, the production efficiency is improved, and the production process is suitable for industrial large-scale application.

Description

technical field [0001] The invention belongs to the technical field of silicon dioxide preparation, and in particular relates to a method for preparing high-purity optical coating material silicon dioxide. Background technique [0002] High-purity silica has excellent physical and chemical properties, high hardness, high temperature resistance, corrosion resistance, low electrical conductivity, good wave transmission performance, and stable performance. In particular, its internal molecular chain structure, crystal shape and lattice change rules make it have a small thermal expansion coefficient, high insulation, piezoelectric effect, resonance effect and its unique optical characteristics. It is used in many high-tech fields such as new electric light sources, Microelectronics, high-insulation sealing, aerospace, national defense and other fields have been more and more widely used. [0003] With the rapid development of high-tech industries such as optical fiber industry,...

Claims

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Application Information

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IPC IPC(8): B02C21/00B02C23/08B03C1/02C01B33/12
CPCB02C21/00B02C23/08B03C1/02C01B33/12
Inventor 李洪亮李晨
Owner 江苏微纳光膜科技有限公司
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