An Epitaxial Growth Method for Large-area Metal Halide Perovskite Single Crystal Arrays for Nuclear Radiation Detection and Imaging
A halide perovskite and large-area metal technology, applied in the directions of single crystal growth, single crystal growth, liquid phase epitaxial layer growth, etc., can solve the problems of complex steps, cumbersome work, and single function
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Embodiment 1
[0048] An epitaxial growth method for a large-area metal halide perovskite single crystal array for nuclear radiation detection imaging, comprising the following steps:
[0049] (1) Pretreatment of CPB substrate: first polish the substrate with 1200-mesh coarse sandpaper to remove the scratches caused by line cutting on the surface of the substrate, and then use 7000-mesh fine sandpaper for fine polishing, and finally use a particle size of A 0.05 μm alumina polishing powder was finely polished. After polishing, the CPB substrate was cleaned with ethanol and dried for later use. The size of the substrate was 12 mm×12 mm.
[0050] (2) The material of the mask used is molybdenum, the size is: 5mm × 5mm, the thickness is 20μm, the size of each hollow unit on it is 100μm × 100μm, and the distance between adjacent hollow units is 100μm. The schematic diagram of the structure is as follows image 3 As shown; hydrophobic treatment of the customized mask with hollow array: first, ultr...
Embodiment 2
[0054] An epitaxial growth method for a large-area metal halide perovskite single crystal array for nuclear radiation detection imaging is as described in Embodiment 1, the difference is that the mask material used is changed to silicon semiconductor material.
Embodiment 3
[0056] An epitaxial growth method of a large-area metal halide perovskite single crystal array for nuclear radiation detection imaging is as described in Example 1, the difference is: the mask material used is changed to parylene or poly imide.
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