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Charged particle beam equipment

A charged particle beam and charged particle technology, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of affecting the resolution of the microscope, sample damage, and increasing the aberration of the electron beam system, so as to improve the resolution and reduce the The effect of interaction and elimination of chromatic aberration

Inactive Publication Date: 2021-06-25
INSITUTE OF BIOPHYSICS CHINESE ACADEMY OF SCIENCES +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is well known that high electron energy can improve the high resolution of the device, but may cause some damage to the sample
Low-speed electrons have greater electron interaction in the travel space, which increases the aberration of the electron beam system, especially the chromatic aberration of the electron beam, thus affecting the resolution of the microscope
Therefore, it is still a challenge for the industry to achieve a microscope with a good resolution while achieving a wide range of landing energies.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] figure 1 is a schematic structural diagram of the charged particle beam device 1000 in the embodiment of the present invention. It can generate, focus, deflect and scan a charged particle beam to act on conductive or non-conductive samples.

[0044] Such as Figure 1-3 As shown, the charged particle beam device includes a charged particle source 300 , a focusing magnetic mirror group, an astigmatism compensation system 150 , a scanning deflector 90 , and a composite lens group 400 .

[0045] Charged particle source 300 (see figure 1 with figure 2 ) can be a metal oxide / tungsten thermal field emission charged particle source, including a cathode 10 for generating a primary charged particle beam 15 . It also includes a Schottky electrode 20 and an extraction pole 30, which are used to generate a high-voltage electric field to absorb and accelerate the primary charged particle beam 15 emitted by the cathode 10, and then the primary charged particle beam 15 enters the ...

Embodiment 2

[0056] Such as Figure 4 As shown, the charged particle beam device in this embodiment is used as a scanning electron microscope, which can generate, focus, deflect and scan a charged particle beam to act on a conductive sample or a non-conductive sample, and collect the released charged particles or X-ray is used to generate surface topography images of samples.

[0057] On the basis of the charged particle beam apparatus in Embodiment 1, the scanning electron microscope of the present invention includes a first detection device 80 and a Wien Filter 100 .

[0058] The first detection device 80 is located above the sample 130 , and collects backscattered electrons or secondary electron signals from above the sample 130 to analyze the shape, material, conductivity and other related information of the sample. In one embodiment, the first detector 80 may be a circular scintillator detector.

[0059] The Wien filter 100 is used to screen the primary charged particle beam and the...

Embodiment 3

[0062] Such as Figure 5 As shown, the charged particle beam apparatus in this embodiment is used as a transmission electron microscope, and on the basis of the charged particle beam apparatus in Embodiment 1, the scanning electron microscope of the present invention includes a second detection device 140 .

[0063] The second detection device 140 is located below the sample 130 , and analyzes the shape, material, density and other related information of the sample surface through the transmitted charged particle signal or X-ray signal collected from the sample 130 . In one embodiment, the second detector 140 is a semiconductor direct detector, which has the characteristics of high efficiency, high speed and good signal-to-noise ratio.

[0064] Similar to Embodiment 1, the charged particles can have a landing energy of 0.1 kev to 100 kev, and in the case of low landing energy, a relatively high speed is still maintained during the journey of the charged particles, which greatl...

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PUM

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Abstract

The invention provides charged particle beam equipment, which comprises a charged particle source, a high-voltage tunnel tube, a focusing magnetic lens group and a compound lens group, wherein the high-voltage tunnel tube is used for accelerating charged particle beams generated by the charged particle source, the focusing magnetic lens group and the compound lens group are sequentially arranged on the periphery of the high-pressure tunnel tube in the advancing direction of charged particle beams, the focusing magnetic lens group is used for focusing the charged particle beams, and the compound lens group is used for focusing electron beams on a sample. By adopting the charged particle beam equipment, electrons with low falling energy also have higher speed in the high-voltage tunnel tube, so that the interaction of the electrons can be reduced, the chromatic aberration can be eliminated, and the resolution ratio in a low-voltage mode can be improved.

Description

technical field [0001] The present invention relates to a charged particle beam device, which has an ultra-large electron energy working range, such as the landing energy on a sample is from 100ev to 100kev, which increases the range of applicable energy. The present invention particularly relates to a scanning / transmission electron microscope , which can reduce electron interaction under low-energy electron beam imaging conditions, thereby improving resolution. Background technique [0002] Charged particle beam equipment is widely used in industry, biology, materials science, semiconductor and other fields, and can process or detect samples at the microscopic scale of nanometer scale. When used to detect samples, charged particle beam equipment can generate electron beams and focus them on conductive or non-conductive samples, and then collect the released charged particles, X-rays and other information from the samples to form images. Electron microscopes with a wide ran...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/28H01J37/26H01J37/141
CPCH01J37/141H01J37/261H01J37/28
Inventor 卢志钢曹峰姚一帆纪伟徐强孙飞徐涛
Owner INSITUTE OF BIOPHYSICS CHINESE ACADEMY OF SCIENCES
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