Preparation method of self-defined metal micro-nano sheet
A micro-nano, self-defined technology, applied in nanotechnology, metal material coating technology, microstructure technology, etc., can solve the problems of low control accuracy, poor repeatability, and low controllability, and achieve strong controllability and repeatability. High performance and high reliability
Pending Publication Date: 2021-07-23
WESTLAKE UNIV
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Problems solved by technology
[0005] Aiming at the problems of low controllability and poor repeatability of parameters such as structure, size, and material in the existing technology for preparing micro-nano metal sheets, the present invention proposes a preparation method of self-defined metal micro-nano sheets, which can improve the preparation of the prior art The problems of low precision and low cleanliness can be controlled during the process of micro-nano metal sheets, and micro-nano metal sheets with customizable shapes, precise control of structural parameters, and high cleanliness can be finally prepared
Method used
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preparation example Construction
[0059] A method for preparing a custom metal micro-nano sheet, comprising:
[0060] (1) Clean the substrate: take silicon as the substrate as an example, use acetone and absolute ethanol to ultrasonically clean the silicon wafer for 15 minutes respectively, take out the silicon wafer after cleaning, dry the surface solution of the silicon wafer with a nitrogen gun, and place it on a heating table Heat to remove residual solution from the surface, see figure 1 Middle a.
[0061] (2) Spin-coating mask: Take electron beam exposure as an example, spin-coat polymethyl methacrylate (PMMA) on the sample surface, the spin-coating acceleration is 2500r / s2, the rotation speed is 5000r / s, and the time is 60s; Baking is then performed at a temperature of 175° C. for 180 s; the thickness of the PMMA on the substrate is about 210 nm. Taking ultraviolet lithography as an example, spin-coating mask and exposure need to be combined alternately: spin-coat photoresist AZ-5206E on the surface o...
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Abstract
The invention discloses a method for preparing a self-defined metal micro-nano sheet. The method comprises the following steps: cleaning a substrate, spin-coating an organic adhesive material, designing a structure through a micro-nano processing technology, preparing a mask, evaporating metal, removing the organic adhesive material, forming a gap layer between a metal structure and the substrate, and transferring the metal structure by using a conical probe. The metal structure is prepared through the micro-nano machining technology, operation is easy and convenient, the controllability and repeatability of the needed structure are high, and the prepared structure has an atomic-scale flat low-roughness surface, impurities are avoided, and the cleanliness is extremely high.
Description
technical field [0001] The invention relates to the field of preparation of metal micro-nano sheets, in particular to a preparation method of self-defined metal micro-nano sheets. Background technique [0002] Metal micro-nano sheet refers to a metal sheet whose planar dimensions such as length, width, and diameter are on the order of microns, and the longitudinal dimension of thickness is on the order of nanometers. It has atomic-level flat surface roughness, and the edges of the structure remain continuous and intact. Through transfer technology (such as tapered optical fiber), metal micro-nanosheets can be flexibly and widely used in many aspects, such as used in optical drive research. Driving objects, used as metal electrodes in micro-nano electronic devices, used for precise positioning in micro-nano processing, etc. [0003] The key to realizing reliable applications is to be able to efficiently and controllably prepare micro-nanosheets of various shapes and structur...
Claims
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IPC IPC(8): B81C1/00B82Y40/00
CPCB81C1/00166B81C1/00388B81C1/00523B81C1/00349B82Y40/00
Inventor 吕未唐伟伟仇旻张磊严巍贾倩楠
Owner WESTLAKE UNIV