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Visible light assisted diamond chemical mechanical polishing solution and polishing method

A chemical-mechanical and visible light technology, applied in polishing compositions containing abrasives, grinding tools, etc., can solve the problems of low polishing efficiency, polluted environment, poor polishing quality, etc. simple effect

Active Publication Date: 2021-12-24
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems of poor polishing quality, low polishing efficiency, and environmental pollution of traditional diamond chemical mechanical polishing methods, the present invention provides a visible light-assisted diamond chemical mechanical polishing method, which realizes high-efficiency ultra-smooth and green chemical mechanical polishing of diamonds

Method used

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  • Visible light assisted diamond chemical mechanical polishing solution and polishing method
  • Visible light assisted diamond chemical mechanical polishing solution and polishing method
  • Visible light assisted diamond chemical mechanical polishing solution and polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] 1) Prepare components A and B of polishing fluid. Among them, in component A: the concentration of hydrogen peroxide is 20wt%, the concentration of diamond powder is 0.06g / ml, the particle size is 0.5-1μm, and the weight percentage of deionized water is 74%. After mixing, stir evenly and oscillate in an ultrasonic device 10min. Among them, in component B: ZnO-Fe 2 o 3 The concentration is 0.1334g / l, oscillating in ultrasonic equipment for 10min.

[0024] 2) Use the size , Surface roughness Ra10nm glass disk as a polishing disk, rinse with deionized water before polishing.

[0025] 3) Place a 100w incandescent light bulb on a bracket at 15cm directly above the polishing disc. Under the irradiation of a visible light source, components A and B of the polishing solution are added dropwise at the same time to perform chemical mechanical polishing on the single crystal diamond crystal; the polishing equipment is an automatic pressure Grinding and polishing machine, set...

Embodiment 2

[0028] 1) Prepare components A and B of polishing fluid. Among them, in component A: the concentration of hydrogen peroxide is 15wt%, the concentration of diamond micropowder is 0.04g / ml, the particle size is 0-0.25μm, and the weight percentage of deionized water is 81%. Shake for 10 minutes. Wherein, in component B: the concentration of titanium dioxide-doped nano-diamond is 0.02667g / l, and it is vibrated in an ultrasonic device for 10 minutes.

[0029] 2) Use the size , Surface roughness Ra10nm glass disk as a polishing disk, rinse with deionized water before polishing.

[0030] 3) Place a 100w incandescent light bulb on a stand 10cm directly above the polishing disc. Under the irradiation of a visible light source, components A and B of the polishing solution are added dropwise at the same time to chemically mechanically polish the single crystal diamond crystal; the polishing equipment is an automatic pressure Grinding and polishing machine, set the polishing pressure ...

Embodiment 3

[0033] 1) Prepare components A and B of polishing fluid. Among them, in component A: the concentration of hydrogen peroxide is 25wt%, the concentration of diamond powder is 0.08g / ml, the particle size is 1-3μm, and the weight percentage of deionized water is 67%. After mixing, stir evenly and oscillate in an ultrasonic device 10min. Among them, in component B: the concentration of copper-iron hydrotalcite doped with nano-diamond is 0.2667g / l, and it is shaken in an ultrasonic device for 10 minutes.

[0034] 2) Use the size , Surface roughness Ra10nm glass disk as a polishing disk, rinse with deionized water before polishing.

[0035] 3) Place a 100w incandescent light bulb on a stand 20cm directly above the polishing disc. Under the irradiation of a visible light source, components A and B of the polishing solution are added dropwise at the same time to chemically mechanically polish the single crystal diamond crystal; the polishing equipment is an automatic pressure Grind...

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Abstract

The invention provides a visible light assisted diamond chemical mechanical polishing method, and belongs to the field of ultra-precision machining of ultra-hard materials. The polishing solution is composed of a grinding material, an oxidizing agent, a visible light photocatalyst and deionized water. According to the invention, under irradiation of a visible light source, a polishing solution is used for conducting chemical mechanical polishing on diamond, wherein the visible light source is arranged at the position 10-20 cm right above a polishing disc, the polishing disc (pad) is a glass disc or a polyurethane polishing pad, the rotating speed of the polishing disc (pad) is 50-70 r / min, the polishing pressure is 1-2 MPa, the flow of the polishing solution is 10-20 ml / min, and the surface roughness of the polished diamond can reach 0.250 to 0.354 nm; high-efficiency ultra-smooth chemical mechanical polishing of the diamond is realized; compared with a traditional polishing method, the crystal surface roughness is reduced, and the polishing efficiency is improved; and compared with an ultraviolet light-assisted chemical mechanical method, used equipment is simple in structure and high in practicability.

Description

technical field [0001] The invention belongs to the technical field of ultra-precision processing of superhard materials, and relates to a visible light-assisted diamond chemical mechanical polishing liquid and a polishing method. Background technique [0002] Diamond's excellent mechanical, thermal, optical, acoustic, electrical and chemical properties enable it to be used in ultra-precision machining, as well as in the fields of optics, acoustics and microelectronics. Applications in these fields have high requirements on the machining accuracy and surface quality of diamond. Due to its high hardness, high brittleness, high chemical stability and other characteristics, diamond has become an extremely difficult material to process. Therefore, it is very important to realize high-efficiency ultra-precision machining of diamond. [0003] At present, the processing methods for improving the surface quality of diamond include mechanical polishing, thermochemical polishing, ion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02B24B1/00B24B37/11
CPCC09G1/02B24B1/00B24B37/11
Inventor 金洙吉杨辉鹏王洪超牛林张笑宇
Owner DALIAN UNIV OF TECH
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