Use of dyestuff containing straight chain alkane ketnoe or cyclanone as main body in two-photon polymerized sensitization
A two-photon polymerization and cycloalkane ketone technology, which is applied in the field of two-photon polymerization sensitization of dyes containing linear alkane ketones or cycloalkane ketones as the main body, can solve the problem of high two-photon polymerization that ordinary photopolymerization dyes do not have. Causes problems such as efficiency, and achieves the effect of convenient adjustment, large two-photon absorption cross section, and low price
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Embodiment 1
[0032] In a 250ml container, add 80 grams of toluene and 10 grams of polymethyl methacrylate, stir to dissolve it, then add 4 grams of hydroxyethyl methacrylate and 4 grams of hydroxypropyl methacrylate, 0.7 grams of bis-( P-N.N-dimethylaminobenzylidene) acetone and 0.3 gram of dodecyl mercaptan, after fully mixing, finally add 1.0 gram of hexaarylbiimidazole, after all dissolved, the prepared two-photon polymerization sensitization material . It is coated on the upper surface of the glass substrate by scraping, and after the coating film is dried, the optical storage material capable of two-photon polymerization is obtained. Using a laser light source with a wavelength of 700-1064nm, an average output power of 5-100 milliwatts, and a pulse width of 120 femtoseconds, it is focused into a spot with a diameter of less than 60 microns, and image storage is performed through two-photon photopolymerization.
Embodiment 2
[0034] The two-photon polymerization sensitized material was prepared according to the method in Example 1. The raw materials used are:
[0035] 75 grams of mixed solvent of chloroform and methanol (volume ratio 10 to 1)
[0036] 10 g polyvinyl acetate
[0037] 8 grams of hydroxyethyl methacrylate
[0038] N-Vinylcarbazole 4.8g
[0039] Bis-(p-N,N-diethylaminobenzylidene)cyclohexanone 0.6g
[0040] Dodecyl Mercaptan 0.4g
[0041] Hexaarylbisimidazole 1.2g
[0042] The prepared two-photon polymerization sensitizing material is coated on the polyester sheet substrate by spin coating, and dried to form a thin film. Use a laser light source with a wavelength of 700-1064nm, an average output power of 5-100 milliwatts, and a pulse width of 120 femtoseconds to focus into a spot with a diameter of less than 60 microns for processing three-dimensional micron patterns. The recorded information can be passed Two-photon fluorescence method readout.
Embodiment 3
[0044] The two-photon polymerization sensitized material was prepared according to the method in Example 1. The raw materials used are:
[0045] Toluene 80g
[0046]6 g polymethyl methacrylate
[0047] Cellulose acetate 6 g
[0048] 3 g Hydroxyethyl Methacrylate
[0049] N-Vinylcarbazole 2.9g
[0050] Bis-(p-ethylbenzylidene)cyclopentanone 0.8g
[0051] BYK 066 0.2 g
[0052] BYK 354 0.3 g
[0053] Diphenyliodonium tetrafluoroborate 0.8g
[0054] The prepared two-photon polymerization sensitizing material is coated on the organic glass substrate by means of dip coating and dried to form a thin film. Using a laser light source with a wavelength of 700-1064nm, an average output power of 5-100 milliwatts, and a pulse width of 120 femtoseconds, it is focused into a spot with a diameter of less than 60 microns, and image storage is performed through two-photon photopolymerization.
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