32results about How to "Enhanced two-photon absorption cross section" patented technology

The invention discloses a pyrrolidine double-fluorine-boron strong fluorescent dye and a preparation method and application thereof, wherein the structure is as shown in formula (1), R1, R2 and R3 areH or C1-C6 linear or branched alkyl group, R5 is H, Cl, xylylene group, nonane group, benzene ring group, OR9, NR9R10, or SR9. R4, R6, R7 and R8 are each independently H, C1-C6 linear or branched alkyl, C1-C6 linear or branched cycloalkane group; wherein R9 and R10 are each independently H, CH2COOEt, oxo group, xylyl group, C1-C6 linear or branched alkyl or C1-6 linear or branched cycloalkane group; the pyrrolidine double-fluorine-boron strong fluorescent dye has the advantages of up to 998 GM double-photon absorption cross section at 700-900nm, high molar absorption coefficient, high fluorescence quantum yield, high light stability and double photon fluorescence and the like.

The invention provides a coumarin oxime ester photoinitiator and a preparation method thereof. The molecular structure general formula is shown in the formula (I). The photoinitiator triggers photocuring under the radiation wavelength of 360-450 nm, and is applied to the fields such as single-photon 3D printing, double-photon 3D printing, printing ink and photoresist. The photoinitiator can serveas an LED photoinitiator and a double-photon photoinitiator, good triggering activity is achieved, one photoinitiator has two purposes, and the manufacturing cost is reduced to a certain degree.

The present invention discloses a chemical amplification-type positive photoresist, including raw materials of the following: in parts by weight, 0.0001 to 2 parts of a photosensitizing dye, 0.005 to 10 parts of a photoacid generator, 5 to 80 parts of an acid degradation resin, 0 to 60 parts of a dissolution inhibitor, and 20 to 90 parts of an organic solvent. The invention also discloses a preparation method and application of the photoresist. The invention is characterized in that: a sensitized acid-generation system is simple in composition and convenient in preparation, and has reliable acid-generation effect under the excitation of two-photon; the sensitizer two-photon absorption is large in cross-section, simple in synthesization, and low in cost; and the photoresist prepared by the sensitized acid-generation system has a high processing resolution, and a low processing energy threshold value.

The invention discloses a photoresist and a method for forming a photoetching pattern. The photoresist comprises the following components: resin, a photoacid generator, an additive and a solvent, wherein the photoacid generator is a sulfonium salt compound taking stilbene as a conjugated structure. The photoresist disclosed by the invention has very high chemical stability and can be stored for along time under the condition of dark room temperature. A large two-photon absorption cross section is formed from an ultraviolet region to a visible light region, so that the photoetching effect is good. The exposure threshold value is very low, and the processing resolution is high.

The invention relates to the technical field of the dual-photon fluorescence probe, and specifically relates to an application of the dual-photon fluorescence probe. The dual-photon fluorescence probeis applied to the cell and tissue imaging and used for detecting lipid raft content and distribution dynamic; the probe can improve the accuracy, precision, sensitivity and imaging resolution of thelipid raft detection, thereby providing a new thought for further preventing and controlling Alzheimer's disease and Prion Disease and like neurodegenerative diseases.

The invention discloses a method for improving the nonlinear absorption performance of a warped acene compound, belongs to the field of synthesized optical nonlinear materials, and particularly relates to a method for improving the nonlinear absorption performance of the warped acene compound. The invention aims at solving the problem in the prior art that the nonlinear absorption performance of the warped acene compound cannot be improved. According to the method for improving the nonlinear absorption performance of the warped acene compound, the warped acene compound comprises pyrenyl acenemolecules, and the ratio of the LUMO track occupancy to the HOMO track occupancy of three linear benzene ring structures of the pyrenyl acene molecules is increased, that is to say, the ratio of LUMO/HOMO is increased. The method has the advantages that by increasing the ratio of LUMO/HOMO, the biphoton absorption cross section of the pyrenyl acene molecules is enlarged, and the purpose of improving the nonlinear absorption performance of the pyrenyl acene molecules is achieved. The method is mainly used for synthesizing the warped acene compound.

The invention relates to the technical fields of luminous material, two-photon absorption material, optical storage and the like, in particular to two-photon induced luminous compound with symmetrical both ends and a synthesis method and purposes thereof. Raw material sodium methoxide is added into N, N-DMF solvent which is dissolved with phosphate reagent to be uniformly stirred, and then aldehyde is added in to react; the reaction solution is poured into water and filtered; the prepared hot ethanol for residue is filtered; and chromatographic separation is carried out to the rest solid, andthe two-photon induced luminous compound with symmetrical both ends is prepared. After being doped into an epoxy resin solid matrix, the two-photon induced luminous compound with both ends symmetrical prepares strong two-photon induced luminous solid material which can be used for fluorescent probes or fluorescence imaging material. The two-photon induced luminous compound with symmetrical both ends of the invention is a type of two-photon induced luminous 1, 2, 2 and 4-tetramethyl-dihydro-quinoline compound with both ends symmetrical, and the structure of the two-photon induced luminous compound is shown as the accompanying drawing.