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Ultraviolet ray solidification cation type etching glue for nano embossing

A nano-imprinting, cationic technology, applied in the field of etchant, can solve the problems of bubble curing strength, poor reproduction accuracy, insufficient extrusion, etc., to achieve good film formation stability, ensure etching accuracy, Guarantee the effect of imprinting and replicating accuracy and efficiency

Inactive Publication Date: 2011-07-27
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a UV-curable cationic etchant for nanoimprinting, which solves the problem that in the nanoimprint manufacturing process, the traditional etchant tends to generate bubbles or reduce the curing strength, thereby reducing the precision of the replica. Problems with poor or insufficient extrusion into the fine feature cavities of the mold

Method used

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  • Ultraviolet ray solidification cation type etching glue for nano embossing
  • Ultraviolet ray solidification cation type etching glue for nano embossing
  • Ultraviolet ray solidification cation type etching glue for nano embossing

Examples

Experimental program
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Effect test

Embodiment 1

[0043] First select the mixture of diaryliodonium phosphate and triarylsulfonium hexafluoroantimonate as photoinitiator, and the weight of photoinitiator is 3% of the total weight of the etchant, of which diaryliodonium phosphate accounts for 70% of the photoinitiator, triarylsulfonium hexafluoroantimonate accounts for 30% of the photoinitiator, take 15% of the total weight of triethylene glycol divinyl ether, and put the photoinitiator diaryliodonium phosphate in the Dissolve with triethylene glycol divinyl ether at 50°C, add triarylsulfonium hexafluoroantimonate and stir after cooling to room temperature to form a homogeneous solution A; 3,4-epoxy groups with a total weight ratio of 53.6% 3',4'-Epoxycyclohexylmethyl cyclohexanecarboxylate 15% linear polydimethylsiloxane 10% polycaprolactone diol was added into the device and stirred at high speed. After stirring and mixing for 2 hours, a uniform liquid B was formed. Then, solution A was added, and then mixed and stirred f...

Embodiment 2

[0045] Firstly, a mixture of 1% diaryliodonium phosphate and 1% triarylsulfonium hexafluoroarsenate in total weight ratio was selected as the photoinitiator, and the photoinitiator diaryliodonium phosphate was heated at 50 °C. Dissolve with 1,4-cyclohexyl dimethanol divinyl ether, the amount of 1,4-cyclohexyl dimethanol divinyl ether is 10% of the total weight ratio, after dissolving, cool to room temperature and add triarylsulfonium hexafluoroarsenic acid-acid-acid-3',4'-epoxycyclohexylmethyl ester and 20% bis-(3 , 4-epoxycyclohexyl)-adipate mixture 20% polycaprolactone triol was added into the device and stirred at a high speed. After stirring and mixing for 2 hours, a uniform liquid B was formed. Then, the solution A was added, and the uniform liquid C was obtained by mixing and stirring for 2 hours. Then, the total weight ratio of adding while stirring was: 8% polyether alkyl co-modified silicone oil defoaming agent, leveling agent and coupling agent auxiliary agent, aft...

Embodiment 3

[0047] First, a mixture of 0.2% diaryliodonium phosphate and 0.8% triarylsulfonium hexafluoroantimonate by weight was selected as the photoinitiator, and the diaryliodonium phosphate photoinitiator was heated at 50 °C. Dissolve with the mixed solution of glycerol carbonate allyl ether and dodecyl vinyl ether, the mixed solution of glycerol carbonate allyl ether and dodecyl vinyl ether is 40% of the total weight ratio, and after dissolving, it is cooled to At room temperature, add triarylsulfonium hexafluoroantimonate and stir to form a homogeneous solution A; 3,4-epoxy-6-methyl-cyclohexylcarboxylic acid-3′, 4′ with a total weight ratio of 10% respectively - Epoxy-6'-methylcyclohexylmethyl ester and 30% bulk polydimethylsiloxane 15% 1,2-epoxyhexadecane was put into the device and stirred at a high speed. After stirring and mixing for 2 hours, a homogeneous liquid B was formed. Then, solution A was added, and then mixed and stirred for 2 hours to obtain a homogeneous liquid C. ...

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Abstract

The present invention discloses an UV photocuring cationic etchant for nano press-printing process. Its composition includes 10%-60% of fatty epoxide resin, 0%-30% of organic silicone epoxy resin, 10%-40% of vinyl ether, 0%-20% of polycaprolactone polyalcohol, 0%-15% of long-chain fatty epoxide resin, 1%-10% of photo-initiator and 0%-8% of adjuvant. The photo-initiator is one or more than one compounds selected from diaryl iodine onium phosphate, triaryl sulphur onium hexafluoroantimonate or triaryl sulphur onium hexafluoroarsenate, and the adjuvant includes organic silane coupling agent, organic silane flow agent and organic alcohols or polyether alkyl comodified silicone oil defoaming agent.

Description

technical field [0001] The invention relates to an etchant, in particular to a UV-curable cationic etchant used in nano-imprint manufacturing. Background technique [0002] In the traditional photolithography integrated circuit manufacturing process, mask exposure method is used to form the shape or inversion of the integrated circuit in the designated area of ​​the photoresist, and the photoresist used is positive photoresist or negative photoresist. , In order to facilitate the formation of a film of a certain thickness, both positive and negative photoresists contain volatile solvents, and a process of drying the volatile solvents is required after coating and film formation. However, in the nano-imprinting process of manufacturing fine features (including integrated circuits), positive or negative photoresists are completely unsuitable due to the disadvantages of containing volatile solvents and large shrinkage. [0003] Nano-imprinting to manufacture fine features (inc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/039
Inventor 段玉岗丁玉成李涤尘卢秉恒
Owner XI AN JIAOTONG UNIV
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