Thin layer chromatography plates
a thin layer, chromatography technology, applied in the direction of instruments, other chemical processes, separation processes, etc., can solve the problems of affecting the amount of deposition of coating materials achieved, affecting the efficiency of ald process, and affecting the amount of deposition of coating materials, etc., to prevent unwanted secondary interactions, improve separation efficiency, and eliminate the use of any binder
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III. WORKING EXAMPLES
[0105]The following working examples are for illustrative purposes only and are not meant to be limiting with regards to the scope of the specification or the appended claims. Example 1 is representative of how the CNT structures were grown for all examples carried out.
example 1
[0106]The masks for photolithography were all based on a zig-zag geometry with 90° angles. Silicon wafers (University Wafers, South Boston, Mass.), 4″ diameter, were used as the backing material. A thin film of photoresist, AZ-3312-F (AZ Electronic Materials USA Corp, Somerville, N.J.), was spin coated onto the wafer. The resulting wafer was patterned via photolithography (Karl Suss Mask Aligner, Vermont, USA), followed by e-beam evaporation (Benton Vacuum E-beam Evaporator, Moorestown, N.J.) of a thin barrier layer of alumina (35 nm), and thermal evaporation (custom-built apparatus) of a few nanometers of iron (6 nm). The iron deposition was monitored using a quartz crystal device. The photoresist was then lifted off with a resist stripper (Micropsoit 1165, MicroChem, Newton, Mass.), leaving a pattern of Al2O3 / Fe at the surface.
[0107]The photolithographically patterned wafer was loaded into a fused silica tube (22 mm ID), preheated at 200° C. in a Lindberg / Blue M tube furnace (Ther...
examples 3-6
[0109]The use of one or more adhesion promoters (FIGS. 13B-13D), such as the contemplated amorphous carbon and / or alumina priming layers discussed in more detail below was believed to increase the number of nucleation sites on the CNTs, thereby allowing more conformal growth to take place. It was thought that only a very thin layer, perhaps only a few nanometers, of one or more adhesion priming layers may be sufficient to increase the number of nucleation sites available for subsequent infiltration or coating (e.g., through ALD or similar process). Accordingly, a small amount of carbon was deposited onto CNTs using ethylene diluted in argon at 900° C. The resulting carbon layers showed good conformality and even some measure crystallinity, as suggested by the texture of the TEM images of FIGS. 14A and 14B.
[0110]To explore whether these few nanometers of carbon might improve ALD or pseudo-ALD on CNTs, and to show that these plates indeed exhibit the desired stability and chromatograp...
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