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Producing method of low-radiation self-cleaning composite function glass

A composite function, low-radiation technology, applied in the field of glass, can solve the problems of difficult to achieve high transmittance, reduced glass transmittance, low emissivity, etc. Effect

Active Publication Date: 2012-01-25
CHINA LUOYANG FLOAT GLASS GROUP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Patent CN11562843A mentions a low-emission self-cleaning glass, which is a low-emission self-cleaning coated glass with a multilayer film structure mainly composed of titanium nitride, produced by magnetron sputtering, which is controlled by TiN x The stoichiometric number can control the color change of the x film layer, due to the TiN x The film layer makes the functional glass colored, resulting in a decrease in the transmittance of the glass. The low emissivity of the product prepared by this method ranges from 0.28 to 0.35
Because the color of the film changes with the thickness, it is difficult for this kind of functional glass to meet the requirements of low emissivity under high transmittance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are SiO 2 Transition layer, Sb 3+ , F - ion-doped SnO 2 Layer, La 3+ ion-doped SiO2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO 2 The controlled thickness of the layer is 250nm, SiO 2 -TiO 2 The controlled thickness of the layer was 15 nm.

[0024] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid at a molar ratio of 1:14:6:0.03, and mix and stir at room temperature for 6 hours to make it hydrolyze to produce silica sol .

[0025] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add An anhydrous ethanol solution of trifluoroacetic acid and antimony trichloride, the molar ...

Embodiment 2

[0033] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are SiO 2 Transition layer, Sb 3+ ion-doped SnO 2 layer, Zn 2+ ion-doped SiO 2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO 2 The controlled thickness of the layer is 200nm, SiO 2 -TiO 2 The controlled thickness of the layer was 20 nm.

[0034] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid at a molar ratio of 1:14:6:0.03, and mix and stir at room temperature for 6 hours to make it hydrolyze to produce silica sol .

[0035] The SnO 2 Preparation: Mix tin protochloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add trichloride with a molar ratio of 0.04:40 Antimony trioxide and absolute ethanol solution, cont...

Embodiment 3

[0043] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are successively SiO 2 Transition layer, F - ion-doped SnO 2 layer, Ag + ion-doped SiO 2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO 2 The controlled thickness of the layer is 250nm, SiO 2 -TiO 2 The controlled thickness of the layer was 20 nm.

[0044] The SiO 2 Preparation: mix ethyl orthosilicate, ethanol and deionized water, then add organic acid or inorganic acid as catalyst, stir and mix at room temperature, make it hydrolyze and polymerize, and make silica sol. Ethyl orthosilicate: ethanol: deionized water: organic acid or inorganic acid are mixed in a molar ratio of 1:14:5:0.03.

[0045] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir at 80°C for 20 hours in a consta...

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Abstract

This invention relates to a manufacture method of a low radiation self-cleaning complex function glass. This glass has trilamellar membrane structure, membranous layer from glass outward in turns is: SiO2 transition layer, ion adulterated SnO2 layer, ion adulterated SiO2 - TiO2 layer. The on-line preparation method is sol-gel method, combine with atomizing sedimentation, utilize thermal decomposition and coagulation process of collosol at 450 DEG C to 550 DEG C to proceed heat sedimentation, in turns form membranous layer on the on-line glass plate surface. This invention through controlling the coating material concentration, dopant ion variety, thermal decomposition temperature and membranous layer thickness bring low radiation to the glass coated this membrane, execute stable uniwafer low emissivity glass, reduce cost, and realize reprocessing treatment of low radiation steeling and hot bending. The membrane layer has photocatalysis performance, realizes the effects of antibiosis and self cleaning, and finally achieves dual function of low radiation and self cleaning of the glass, with controlling the outer layer protective film TiO2 crystal form.

Description

technical field [0001] The invention belongs to the technical field of glass, and mainly relates to a preparation method of low-radiation white clean composite functional glass. technical background [0002] The basic structure of traditional low-emissivity glass is: glass, dielectric layer, silver layer, and dielectric layer. Among them, the main functional layer that reflects external light is the metal (Ag) coating, but the metal silver layer coating leads to a decrease in light transmittance and an increase in light reflection. The fatal disadvantage of the metal coating is that its physical and chemical properties are not good. Spots will be formed on the glass surface due to atmospheric corrosion, which will cause the film to fall off, lose its low-radiation performance, and affect the appearance. In general, it must be made of hollow glass, and inert gas should be flushed into the hollow to prevent the film from falling off. The cost of the product is relatively hig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34C03C17/23C03C17/245
Inventor 郅晓姜宏朗明郭卫
Owner CHINA LUOYANG FLOAT GLASS GROUP
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