Radio frequency magnetron sputtering method to prepare superhard TiB2/TiAIN nano multilayer film

Abstract

The invention relates to a radio frequency magnetron sputtering method to prepare superhard TiB2 / TiAIN nano-multilayers. By adopting the radio frequency magnetron sputtering technology, a radio-frequency power supply is used to excite plasma to sputter TiB2 and TiAI ceramic targets. Multilayers of TiB2 and TiAIN are deposited on a one-side polished Si (100) substrate. A mechanical pump and a molecular pump are adopted to pump the air pressure in a vacuum chamber to 3.0X10<-4> Pa to 1.0X10<-4> Pa. When TiB2 is deposited, pure argon gas is sputtered. The flow of argon gas is controlled with a mass flow controller, and is kept to be 4sccm to 60sccm. When TiAIN is deposited, argon gas and nitrogen gas are sputtered; and the ratio of nitrogen gas to argon gas is changed from 1:1 to 1:50. During the complete deposition process, the total working air pressure is: 0.1 Pa to 0.8 Pa when TiB2 is deposited; 0.2 Pa to 1.0 Pa when TiAIN is deposited. The cycle of the multi-layers is 30 layers to 200 layers. The novel superhard TiB2 / TiAIN nano-multilayers have the overall characteristics of high hardness, low internal stress, high binding force of the layer base. The novel superhard TiB2 / TiAIN nano-multilayers have important application prospects in reinforced films on the surface of knife edges and moulds.

Description

technical field [0001] The invention belongs to the field of surface strengthening films for various cutting tools and moulds. In particular, it relates to the preparation of superhard TiB by radio frequency magnetron sputtering 2 / TiAlN nano-multilayer film, a new process for synthesizing superhard nano-multilayer surface strengthening film composed of titanium diboride and titanium aluminum nitrogen by radio frequency magnetron sputtering technology. Background technique [0002] At present, among the surface strengthening films for various cutting tools and molds, transition metal nitride films are well-known materials, mainly because they have a certain commonality of high melting point, high hardness and good chemical stability, but they are also They have defects such as high brittleness, high residual stress, and poor bonding with the substrate, which greatly affect their application range. For example: titanium diboride (TiB 2 ) film and titanium aluminum nitrogen...

AI Technical Summary

Problems solved by technology

However, in practical applications, it is impossible to further improve their hardness, wear resistance, bonding force with the substrate, and take into account low brittleness, relatively low stress, and high thickness, because as the thickness of the film increases, these A large columnar crystal structure will appear in the elemental strengthening film, and the brittleness and residual stress will increase accordingly, resulting in its brittle cracking and falling off, making the surface strengthening failure

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