Waste water reclaiming system and method for semi-conductor manufacturing technique tail gas treatment device
A waste water recovery and manufacturing process technology, applied in chemical instruments and methods, multi-stage water/sewage treatment, oxidized water/sewage treatment, etc., can solve the problems of water resource waste cost, inconvenient use, blockage, etc.
Inactive Publication Date: 2008-08-13
锋霈企业股份有限公司
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Problems solved by technology
However, the recovery rate of L / S wastewater treated by RO or UF filtration mechanism only reaches 60% to 70%, and the treated water quality can no longer be provided to L / S, and can only be provided to other equipment that does not require high water quality use or direct discharge, so a large amount of facility water must be provided for wet L / S use, causing a large burden on semiconductor factory water, for example, the water consumption of wet L / S accounts for 40% of the total water consumption of the whole plant % or more, resulting in the waste of water resources and the increase of cost
In addition, the main organic pollutants in wet L / S wastewater are small molecular weight organic matter, which can easily cause RO blockage and fouling, and also cause inconvenience in use
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[0035] 1 is a schematic diagram of a waste water recovery system 100 of the semiconductor manufacturing process tail gas treatment equipment of the present invention, including a storage tank 112 connected to the semiconductor manufacturing process tail gas treatment equipment 110, for collecting waste water, such as suspended solids, passing through the semiconductor manufacturing process tail gas treatment equipment 110 Wastewater with (SS) less than 40mg / L, electrical conductivity less than 700μs / cm, total organic carbon (TOC) less than 6mg / L and fluoride ion concentration less than 60mg / L, the waste water in the storage tank 112 is pressurized by the booster pump 114 to enter Connected to the static mixing unit 126 of the storage tank 112, the addition unit 128 is coupled to the static mixing unit 126 to provide hydrogen peroxide and an alkaline agent, such as sodium hydroxide solution (NaOH (eq)), to the static mixing unit 126, the static mixing unit 126 mixes the waste wa...
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The present invention provides a sewage recycling system of a semiconductor manufacturing technique end gas treating equipment and the method thereof, the system comprises a filtering device which eliminates the particle in the sewage when the sewage of the semiconductor manufacturing technique end gas treating equipment passes through, an oxidizing device for oxidizing the organic pollutant in the sewage, and an ion exchanging device for eliminating the ion in the sewage to generate the recycling water for reusing by the semiconductor manufacturing technique end gas treating equipment and to obtain the purpose of recycling the sewage for reusing.
Description
technical field [0001] The invention relates to a waste water recovery system and method, in particular to a waste water recovery system and method for semiconductor manufacturing process tail gas treatment equipment. Background technique [0002] In the process of manufacturing semiconductors, due to the complexity of the manufacturing process, the chemical components used are quite diverse, so the process tail gas generated is also quite complicated, including acid gases (such as hydrogen fluoride (HF), hydrogen chloride (HCl), nitric acid (HNO 3 ), sulfuric acid (H 2 SO 4 ) and phosphoric acid (H 3 PO 4 ) etc.), alkaline gas (such as ammonia (NH 3 )), organic solvents (such as isopropanol (IPA), acetone, n-hexane, cyclopentanone, propylene glycol monomethyl ether (PGME) and propylene glycol monomethyl ether ester (PGMEA), etc.), and toxic gases (such as arsenic Hydrogen (AsH 3 ), phosphine (PH 3 ), silane (SiH 4 ), dichlorosilane (SiH 2 Cl 2 ), diborane (B 2 h ...
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Login to View More IPC IPC(8): C02F9/04C02F1/72C02F1/42C02F1/78
Inventor 卢宗隆商能洲张朝谦
Owner 锋霈企业股份有限公司