Method for preparing titanium dioxide crystalline state film at low-temperature

A technology of titanium dioxide and nano-titanium dioxide, which is applied in the direction of titanium dioxide, titanium oxide/hydroxide, coating, etc., can solve the problems of long cycle and achieve the effect of simple preparation method and firm combination

Inactive Publication Date: 2008-12-03
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Among them, aqua regia is used for pretreatment, and the treatment is 5 to 6 hours at 120 ° C. This condition has a great limit on the requirements of the substrate. The aminosilane takes 12 hours, which makes the whole process cycle too long, and this method is only for preparing The self-assembled film layer of rare earths does not involve the self-assembly of nano-films other than rare earths

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  • Method for preparing titanium dioxide crystalline state film at low-temperature
  • Method for preparing titanium dioxide crystalline state film at low-temperature
  • Method for preparing titanium dioxide crystalline state film at low-temperature

Examples

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Effect test

Embodiment 1

[0022] A method for preparing a titanium dioxide crystalline film at a low temperature, comprising the steps of:

[0023] (1) Clean the monocrystalline silicon wafer; place it in a mixed solution of concentrated sulfuric acid and hydrogen peroxide with a volume ratio of 7:3 and soak it for 20 minutes at 80°C. Drying, vacuum drying at 100°C for 40 minutes;

[0024] (2) With a concentration of 6×10 -3 The anhydrous cyclohexane solution of M mercaptopropyltrimethoxysilane was soaked at room temperature to treat the substrate for 30 minutes, after taking it out, rinsed with cyclohexane and ethanol successively, and dried with nitrogen;

[0025] (3) Prepare supersaturated methanol or aqueous solution of phosphorus pentoxide, put the substrate after the self-assembly treatment of mercaptopropyltrimethoxysilane into it, and react at 40°C for 30 minutes. water for washing and drying;

[0026] (4) Finally put the substrate into 5mM TiCl 4 / 0.1M HCl aqueous solution, deposit at 80°C...

Embodiment 2

[0031] A method for preparing a titanium dioxide crystalline film at a low temperature, comprising the steps of:

[0032] (1) Wash the glass sheet with water, take out the substrate from the washing solution, put it in hydrogen peroxide and soak it at 15°C for 60 minutes, wash the substrate with ethanol after taking it out, and dry it with air;

[0033] (2) The immersion concentration of the substrate treated in step (1) is 1×10 -3 M SHCH 2 Si(OCH 3 ) 3 soak in anhydrous methanol solution at 15°C for 180 minutes, take it out, wash it with cyclohexane and water successively, and dry it with air;

[0034] (3) Soak the substrate obtained after the treatment in step (2) at 15° C. in a supersaturated methanol solution of phosphorus pentoxide for 120 minutes, take out the substrate, wash it with ethanol and water successively, and dry it;

[0035] (4) Immerse the substrate treated in step (3) at 20° C. in an isopropyl titanate ethanol solution with a concentration of 5 mM to dep...

Embodiment 3

[0037] A method for preparing a titanium dioxide crystalline film at a low temperature, comprising the steps of:

[0038] (1) Wash the ceramic sheet with ethanol and water in turn, take out the substrate from the washing liquid, put it in a mixed solution of acetic acid and hydrogen peroxide with a volume ratio of 1.5:1 at 90°C, soak for 10 minutes, and remove the substrate in turn Rinse with distilled water and blow dry with nitrogen;

[0039] (2) immerse the substrate processed through step (1) into a concentration of 5×10 -2 M's SH(CH 2 ) 16 Si(OCH 3 ) 3 soak in anhydrous methanol solution at 50°C for 30 minutes, take it out, wash it with methanol and water successively, and dry it with air;

[0040] (3) Soak the substrate obtained after the treatment in step (2) at 50° C. in a supersaturated ethanol solution of phosphorus pentoxide for 30 minutes, take out the substrate, wash it with ethanol and water successively, and dry it;

[0041](4) Immerse the substrate treate...

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Abstract

The present invention discloses a method for preparing a crystalline titanium dioxide film at a low temperature, which comprises the steps of:(1) cleaning and drying a substrate;(2) immerging the substrate into an organic solvent solution of X(CH2)nSi(OCH3)3 for soaking, and taking out the substrate for cleaning and drying, wherein the X in the X(CH2)nSi(OCH3)3 is -SH or -CH3 or -Cl or -NH2, n is one of 1 to 16;(3) soaking the substrate in a supersaturation methanol solution of phosphoric anhydride, and taking out the substrate for cleaning and drying;(4) soaking the substrate in an aqueous solution of TiCl4 which contains hydrochloric acid to carry out nano titanium dioxide film deposition and growth, and thus the crystalline titanium dioxide film is made. The method is simple and causes no pollution to environment. The order assembly of phosphosilane on the surface of the substrate is realized, and the substrate is used as a template to direct the assembly and growth of the nanometer titanium dioxide at a low temperature without the need of high temperature calcination. The film has a certain crystal structure, but also fixedly bonded with the surface of the substrate.

Description

technical field [0001] The invention relates to a method for preparing a titanium dioxide film, in particular to a method for preparing a titanium dioxide film at low temperature. Background technique [0002] With the rapid development of industries such as information, energy, and environment, newer and higher requirements are put forward for material performance. Therefore, the research and innovation of new materials must be an important topic and development basis for future scientific research. Due to the special physical and chemical properties of nanomaterials and the resulting special application value, they have become a hot spot in scientific research. [0003] Titanium dioxide has stable chemical properties, can withstand acid or alkali corrosion, and will not decompose under light. TiO 2 It has the characteristics of high photocatalytic activity, stable chemical properties and high refractive index, so it has a very wide range of applications in the fields of ...

Claims

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Application Information

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IPC IPC(8): C01G23/053C03C17/23C04B41/50C04B41/85C03C17/36C08J7/04
Inventor 李张金利蒋玉婷王宪杨锦张楠革
Owner TIANJIN UNIV
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