Method for online production of TCO film glass by float process

A float glass and thin film technology, which is applied in the field of float glass on-line production of transparent conductive oxide thin film glass, can solve the problems of limited wide use, complicated preparation process, low natural reserves, etc. Efficient effect

Active Publication Date: 2009-07-08
WUJIANG CSG GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Currently on the market, TCO thin film In 2 o 3 : Sn, its technology is mature, but because materials such as In, Sn have shortcomings such as few natural reserves, complex preparation process, high cost, toxicity, and poor stability, thereby limiting the widespread use in practice, therefore, there is an urgent need for a Alternative products are developed to meet people's needs

Method used

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  • Method for online production of TCO film glass by float process
  • Method for online production of TCO film glass by float process

Examples

Experimental program
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Effect test

Embodiment 1

[0036] Example 1: Phosphorous-doped silicon dioxide film is used as the base film, and the coating area is in the tin bath; and the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the front end of the annealing kiln.

[0037] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, phosphine, and carbon dioxide with inert gas as the carrier gas, and direct it along the surface to be coated. The inner surface flows; the temperature of the glass ribbon is 655-675°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: phosphine: carbon dioxide = 1:7:0.003:5, nitrogen or argon Gas is used as the diluting gas; the concentrations of various gases after dilution are 10 mol% of silane, 99 mol% of ethylene, 20 mol% of carbon dioxide, and 1 mol% of phosphine; the shielding layer is...

Embodiment 2

[0040] Example 2: the phosphorus-doped silicon dioxide film is used as the base film, and the coating area is in the tin bath; while the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the front end of the annealing kiln.

[0041] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, trimethyl phosphate, and nitrogen oxide with inert gas as the carrier gas, and direct it along the required The inner and outer surfaces of the coating flow; the temperature of the glass ribbon is 675-695°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: trimethyl phosphate: nitrogen oxide = 0.5:1:0.001 : 4. Nitrogen or argon is used as the diluent gas; wherein the concentrations of various gases after dilution are 15 mol% of silane, 100 mol% of ethylene, 20 mol% of nitrogen oxide, an...

Embodiment 3

[0044] Example 3: the phosphorous-doped silicon dioxide film is used as the base film, and the coating area is at the tin bath; and the aluminum-doped zinc oxide film is used as the functional film, and the coating area is at the end of the tin bath.

[0045] In the tin tank of the float glass production line, a reactor is set above the glass ribbon, which is used to dilute the precursor gas mixture of silane, ethylene, phosphorus oxychloride, and nitrogen oxide with inert gas as the carrier gas, and direct it along the required The inner and outer surfaces of the coating flow; the temperature of the glass ribbon is 655-675°C, and the pulling speed of the glass ribbon is 430m / h; the volume ratio of the precursor gas is: silane: ethylene: phosphorus oxychloride: nitrogen oxide = 20:14:0.05 :9, nitrogen or argon as a diluent gas; wherein the concentrations of various gases after dilution are respectively 10 mol% of silane, 80 mol% of ethylene, 10 mol% of phosphorus oxychloride, a...

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Abstract

The invention discloses a float online method for producing TCO film glass. The method comprises that: a chemical vapor deposition method is adopted in a tin groove of a float glass production line; a proplastid gas mixture containing silane, ethene, phosphine, an oxygenous source and a phosphorus source dopant uses inert gas as a carrier; a shielding film layer with thickness of between 45 and 95 nm and refractive index of between 1.65 and 1.85 is formed on the surface of a glass substrate at a temperature of between 635 and 695 DEG C; and within the temperature range of between 550 and 630 DEG C, the proplastid gas mixture containing a zinc source, an aluminum source, a stabilizing agent and a catalyst prefabricated to be gasified uses nitrogen gas or air as the carrier and is introduced to the movable glass surface deposited with the shielding film layer to form a TCO film with thickness of between 250 and 450 nm and low resistivity. The TCO glass has even film layer, high surface resistivity, high conductivity, good wearing resistance, strong alkali resistance and high conductivity and visible light transmittance.

Description

【Technical field】 [0001] The invention relates to the field of float glass, in particular to a method for online production of transparent conductive oxide (TCO) film glass by float method. 【Background technique】 [0002] In 1907, Badeker reported for the first time the translucent conductive CdO thin film prepared by him, and since then began the research on transparent conductive oxide films. In the 1950s, In 2 o 3 base and SnO 2 TCO-based thin films, while ZnO-based thin films appeared in the 1980s, and TCO thin films have been continuously expanded. At present, TCO films are mainly used in two major fields of flat panel displays and buildings. In 2 o 3 : Sn(ITO) film has the advantages of good transparency, low resistivity, easy etching and easy low temperature preparation, etc. It has always been the first choice material for TCO film used in the field of flat panel display. SnO 2 :F film has the characteristics of good thermal stability, good chemical stability...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34C03B18/02
Inventor 白京华王杏娟
Owner WUJIANG CSG GLASS CO LTD
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