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Titanium dioxide thin film with dual-layer nano-ordered structure and preparation method thereof

A titanium dioxide and ordered structure technology is applied in the field of double-layer nano-ordered structure titanium dioxide film and its preparation, and can solve the problems of inability to uniformly cover the nano-ordered array film and the like

Inactive Publication Date: 2009-09-23
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the titanium dioxide nanotube array film is used as the substrate, only the nanotube wall can be used as the nucleation point for the growth of the above-mentioned nano-ordered array. Therefore, conventional preparation methods cannot uniformly cover the nano-ordered array film on the nanotube array.

Method used

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  • Titanium dioxide thin film with dual-layer nano-ordered structure and preparation method thereof
  • Titanium dioxide thin film with dual-layer nano-ordered structure and preparation method thereof
  • Titanium dioxide thin film with dual-layer nano-ordered structure and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0021] 1) Mix hydrofluoric acid with a concentration of 50%, nitric acid with a concentration of 68%, and deionized water in a volume ratio of 1:3:6 to obtain a pickling solution;

[0022] 2) Dissolving 100 mg of hexamethylene in 50 ml of a mixed solution of 30% hydrogen peroxide and 1.0 ml of 63% nitric acid. Set the size to 5×5×0.01(cm 3 ) on the surface of the metal titanium plate was pickled with the pickling solution obtained in step 1) at a temperature of 60°C, then ultrasonically cleaned with deionized water, immersed in the above mixed solution, and reacted at 80°C for 48 hours to take out the metal Titanium plate, centrifuge the reaction solution, remove the suspended powder, and obtain the precursor containing tetravalent titanium ions;

[0023] 3) Another size is 5×5×0.01(cm 3 ) metal titanium plate, pickling the surface with the pickling solution obtained in step 1) at a temperature of 60° C., then ultrasonically cleaning it with deionized water, and then immersi...

Embodiment 2

[0028] The preparation method is the same as in Example 1. The difference is: the anodizing voltage is 25V, and the oxidation time is 15 minutes.

[0029] Structural characterization of double-layer nano-ordered titanium dioxide film:

[0030] image 3 (a) shows that the double-layer film is overall uniform, and the short rutile nanorod arrays are quasi-oriented. The short rods have a diameter of about 40 nm and a length of about 150 nm. image 3 (b) shows that the anatase nanotubes are arranged regularly and oriented, with an average diameter of 50 nm and a wall thickness of about 12 nm. The overall thickness of the film is about 700nm, the upper layer is rutile phase, and the lower layer is anatase phase.

Embodiment 3

[0032] The preparation method is the same as in Example 1. The difference lies in: step 3) the reaction time for immersing the metal titanium plate in the precursor is 48 hours, step 4) anodic oxidation voltage 25V, oxidation time 15 minutes.

[0033] Structural characterization of double-layer nano-ordered titanium dioxide film:

[0034] Figure 4 (a) shows that the double-layer film is overall uniform, and the short rutile nanorod arrays are quasi-oriented. The diameter of the short rods is about 100 nm, and the length is about 250 nm. Figure 4b shows that the anatase nanotubes are regularly arranged, with an average diameter of 100 nm and a wall thickness of about 15 nm. The overall thickness of the film is about 1000nm, the upper layer is rutile phase, and the lower layer is anatase phase.

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Abstract

The invention discloses a titanium dioxide thin film with a dual-layer nano-ordered structure, and the dual-layer thin film is formed by covering an upper layer of quasi-aligned single crystal rutile phase titanium dioxide nano-short rod thin film on a lower layer of aligned anatase nanotube thin film. The invention cleverly utilizes gap in a nano-rod array to provide a channel for ion diffusion to further avoid the restrictions of heterogeneous nucleation dynamic factors, adopts the inner anode oxidation method to successfully prepare the dual-layer thin film consisting of two layers of nano-ordered structure thin films according to the sequence of firstly preparing the upper layer and then preparing the lower layer, and the formed film has good quality, high purity, controlled structure and reference significance for preparing the similar thin film with the nano-ordered structure. The prepared titanium dioxide thin film with the dual-layer nano-ordered structure is expected to be widely applied in thin film solar cells, gas sensors, photocatalysis, photoelectrocatalysis and other fields.

Description

technical field [0001] The invention relates to a titanium dioxide film with a double-layer nanometer ordered structure and a preparation method thereof. Background technique [0002] Nanostructured titanium dioxide films have been widely used in high-tech fields such as photocatalysis, gas sensors, hydrogen production by photolysis of water, thin-film solar cells, biomaterials, and nanodevices. The nanostructure of thin films has an important impact on their optoelectronic properties. For example, studies have shown that compared with the polycrystalline structure, the single-crystal rutile titanium dioxide nanorod ordered array thin film has excellent photoelectron conductivity due to the significantly reduced grain boundary area. Due to the large specific surface area, the titanium dioxide nanotube ordered array film has significantly better photoelectric performance than other forms of titanium dioxide nanostructure film in photocatalysis, gas sensors, and dye-sensitize...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/02C25D11/26H01G9/20H01G9/042H01L31/0264
CPCY02E60/13
Inventor 吴进明宋小梅
Owner ZHEJIANG UNIV
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