Preparation method of chromium-aluminum-nitrogen film by closed field unbalanced magnetron sputtering
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- TAIYUAN UNIV OF TECH
- Publication Date
- 2009-11-11
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for preparing a chromium-aluminum-nitrogen thin film by closed-field unbalanced magnetron sputtering, which belongs to the technical field of surface coating and application of high-strength and high-hardness materials. Background technique
[0002] In the field of machinery manufacturing industry, a large number of metal materials are used. Due to different uses and requirements, the processing of materials is also different. For example, tools with high strength and high hardness and mechanical parts that are wear-resistant and corrosion-resistant require Strengthen and harden it.
[0003] There are also many ways to strengthen and harden tools, molds and mechanical parts, such as surface alloying, infiltrating nickel, chromium, molybdenum, silicon and other elements on the surface of metal materials to enhance their strength and hardness; such as heat treatment, Change the internal metallographic structure of the m...