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Method for preparing transmittance grating

A technology of transmission grating and photoresist, which is applied in the direction of diffraction grating, photomechanical equipment, photoplate making process of pattern surface, etc., can solve the problems of poor performance of transmission grating, achieve excellent ability to resist harsh use environment, excellent thermal The effect of improving stability and dispersion ability

Inactive Publication Date: 2009-12-09
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Ordinary transmission gratings concentrate most of the energy of light on the central zero-order fringe without dispersion effect, and the light intensity at the position of other secondary diffraction fringes with dispersion effect is weaker, so the performance of ordinary transmission grating is poor , so modern grating spectrometers use reflection gratings as dispersive elements instead of transmission gratings

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  • Method for preparing transmittance grating
  • Method for preparing transmittance grating

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Effect test

Embodiment 1

[0019] The transmission grating was prepared by the following method, as figure 1 Shown:

[0020] Step 1, using high-purity aluminum flakes with a purity of 99.999% as raw material, using the method reported in the published literature [Chemistry Letters, 35 (2006) 1336; Nanotechnology, 18 (2007) 365601] to carry out the periodicity of the aluminum flakes Oxidation, the oxidation parameters are: the electrolyte is 0.3Mol / L oxalic acid, the oxidation temperature is 15°C, the oxidation cycle time is 210S, the number of oxidation layers is 10 layers, and the layer distance is 300nm; a three-dimensional layer with a thickness of 3μm is obtained Porous alumina film with periodic structure;

[0021] Step 2, homogenizing: the obtained porous alumina film with a thickness of 3 μm and a three-dimensional layered periodic structure is washed with absolute ethanol and dried, and a layer of thickness of 1 micron is covered on the porous alumina film with a homogenizer photoresist;

[0...

Embodiment 2

[0028] The transmission grating was prepared by the following method:

[0029] Step 1, using high-purity aluminum flakes with a purity of 99.999% as a raw material, using the method reported in the published literature [ChemistryLetters, 35 (2006) 1336; Nanotechnology, 18 (2007) 365601] to carry out periodic oxidation of aluminum flakes, Oxidation parameters are: the electrolyte is 0.3Mol / L oxalic acid, the oxidation temperature is 10°C, the oxidation cycle time is 1000S, the number of oxidation layers is 10, and the interlayer distance is 2 μm; a three-dimensional layered period with a thickness of 20 μm is obtained Porous aluminum oxide film with strong structure;

[0030] Step 2, homogenizing: the obtained layered porous alumina film with a thickness of 20 μm is washed with absolute ethanol and dried, and a layer of photoresist with a thickness of 1 micron is covered on the porous alumina film by a homogenizer;

[0031] Step 3, photolithography: bake the layered porous alu...

Embodiment 3

[0035] Step 1, using high-purity aluminum flakes with a purity of 99.999% as a raw material, using the method reported in the published literature [ChemistryLetters, 35 (2006) 1336; Nanotechnology, 18 (2007) 365601] to carry out periodic oxidation of aluminum flakes, The parameters of oxidation are: the electrolyte is 0.3Mol / L oxalic acid, the oxidation temperature is 10°C, the oxidation cycle time is 150S, the number of oxidation layers is 100, and the interlayer distance is 200nm; Porous aluminum oxide film with strong structure;

[0036]Step 2, homogenizing: the obtained layered porous alumina film with a thickness of 20 μm is washed with absolute ethanol and dried, and then covered with a layer of photoresist with a thickness of 1 micron on the porous alumina film using a homogenizer ;

[0037] Step 3, photolithography: the layered porous alumina film covered with photoresist is baked at 90°C for 3 minutes, and then photolithography is performed after cooling in air for 1...

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Abstract

The invention relates to a method for preparing a transmittance grating. The method is characterized by comprising the following steps: step 1, preparing a porous alumina membrane with a three-dimensional laminar periodic structure by adopting an aluminum sheet with purity of more than 99.99 percent; step 2, washing the porous alumina membrane obtained in the step 1 with ethanol, drying the porous alumina membrane, and coating photosensitive resist with thickness of between 0.8 and 1.2 micrometers on the porous alumina membrane by a spin coater; step 3, drying the porous alumina membrane obtained in the step 2, and scribing parallel line structures with equal distance and equal width on the photosensitive resist on the surface of the porous alumina membrane by an ultraviolet photoetching machine; step 4, soaking the porous alumina membrane which is provided with the parallel line structures scribed on the surface and obtained in the step 3 in phosphoric acid solution for chemical etching, and transferring the parallel line structures scribed on the surface of the porous alumina membrane to the inside of the membrane; step 5, erasing the photosensitive resist left on the surface of the porous alumina membrane with organic solvent, washing and drying the membrane.

Description

technical field [0001] The invention relates to the field of grating preparation, in particular to a method for preparing a transmission grating with higher efficiency. Background technique [0002] Transmission gratings are usually composed of a large number of equal-spaced, equal-width parallel grooves or other structures that can divide the wavefront at equal intervals on a transparent substrate such as glass. It acts like a prism, which can disperse polychromatic light to form a spectrum for study. Gratings are used in a wide range of applications, and are the heart of spectroscopic instruments, as well as key components that require extremely high precision. The performance of the grating directly affects the development of science and technology fields such as geology, metallurgy, petrochemical industry, astronomy, agriculture, medicine, atomic energy, and aerospace. Therefore, modern grating technology is increasingly valued by people. [0003] Ordinary transmission...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G02B5/18
Inventor 王彪张贤鹏李佳宋伟杰费广涛崔平
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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