Method for preparing field emission cathode by micromachining of 157nm deep ultraviolet laser
A field emission and deep ultraviolet technology, used in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problem of unsatisfactory emitter current density and emission uniformity, high cost, and insufficient color purity. and other problems, to achieve the effect of easy digital display, low production cost and good color reproducibility
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[0022] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0023] according to figure 1 The present invention is introduced in detail:
[0024] exist figure 1 The 157nm deep ultraviolet laser source in the vertical direction is passed through CaF 2 After the lens 2 made of material converges into parallel light, it enters the sealed vacuum device 3, and the parallel laser beam 4 converged by the lens is directly directed to the mask plate 5 engraved with the shape of the cathode processing, so that only the laser beam passing through the mask plate The laser beam of the hole can be irradiated on the workpiece 6 of monocrystalline silicon material for etching. The workpiece of monocrystalline silicon material is moved through the precision processing table, and the parameters of laser processing are optimized to improve the etching efficiency and ensure the quality of processing. Then the workpiece of...
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