Silicon substrate organic electroluminescent luminescent device and preparation method thereof
A kind of electroluminescence, electromechanical technology, applied in the direction of electric solid state device, semiconductor/solid state device manufacturing, electrical components, etc., can solve the problems of low hole concentration of n-type silicon and difficult anode.
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Embodiment 1
[0037] Example 1. Preparation of an organic electroluminescent device with a seven-layer organic and cathode film structure with a metal complex as the light-emitting layer
[0038] The device prepared in this embodiment includes an irradiated n-type silicon electrode, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer and a light-transmitting cathode stacked in sequence, and the preparation method is as follows:
[0039] The n-type silicon substrate was ultrasonically cleaned with acetone, ethanol, and deionized water for 20 minutes in sequence; and soaked in 2% HF solution for 4 minutes to remove the natural oxide layer on the surface, and then began to carry out electron irradiation. The equipment used was from Beijing Normal University. BF-5 electron linear accelerator, the irradiation energy is 5MeV, the dose rate is 1.6×10 12 cm -2 the s -1 , an irradiation time of 4 minutes, followed by a 1x...
Embodiment 2
[0042] Example 2. Preparation of a five-layer organic electroluminescent device with an independent phosphorescent emitting layer
[0043] The device includes sequentially stacked irradiated n-type silicon electrodes, a hole transport layer, a light emitting layer, an electron transport layer and a light-transmitting cathode, as follows:
[0044] The anode and substrate are made of n-type silicon irradiated by electrons, the irradiation energy is 5MeV, and the dose rate is 1.6×10 12 cm -2 the s -1 , the irradiation time is 30 minutes; after that, at 1x10 -5 The hole transport layer, the light-emitting layer, the electron transport layer and the cathode are sequentially thermally evaporated on the n-type silicon under a vacuum of Pa, wherein the hole transport layer is about 30-70 nm thick NPB (N,N'-diphenyl base-N-N'bis(1-naphthyl)-1,1'diphenyl-4,4'-diamine); the phosphorescent material bis(2-phenylpyridine) iridium acetylacetonate [(ppy ) 2 Ir(acac)] and host material (4...
Embodiment 3
[0047] Example 3, organic electroluminescent device with small organic molecules as fluorescent light-emitting layer
[0048] The device includes sequentially stacked irradiated n-type silicon electrodes, a hole transport layer, a light emitting layer, an electron injection layer and a light-transmitting cathode, as follows:
[0049] The anode and substrate are made of n-type silicon irradiated by electrons, the irradiation energy is 5MeV, and the dose rate is 1.6×10 12 cm -2 the s -1 , the irradiation time is 30 seconds; after that, at 1x10 -5 The hole transport layer, the light emitting layer, the electron injection layer and the cathode are sequentially thermally evaporated and evaporated on the n-type silicon under the vacuum of Pa. The hole transport layer is about 30-70 nm thick TPD (N,N'-diphenyl-N-N'bis(1-naphthyl)-1,1'diphenyl-4,4'-bis amine); the light-emitting layer is AlQ doped with 1% mass content of coumarin (Quinacridone, QuinacridoneQA), with a thickness of...
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