Cleaning agent for silicon materials and method for cleaning silicon materials

A cleaning agent and silicon material technology, applied in cleaning methods and utensils, cleaning methods using liquids, detergent compositions, etc., can solve the problems of poor process stability, strong corrosion, high cleaning costs, and achieve good biodegradation performance. Effect

Inactive Publication Date: 2011-04-13
LONGI GREEN ENERGY TECH CO LTD
View PDF3 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The strong acid and strong alkali used in the traditional cleaning method are highly corrosive, which is harmful to the operator. The post-treatment of waste gas and waste liquid is cumbersome and seriously pollutes the environment. Due to the chemical reac

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0039] Example 1

[0040] Step 1. Prepare three cleaning agents, SEH-1, SEH-2, and SEH-3 according to the following proportions. The cleaning agent SEH-1 is composed of the following components by mass: fatty alcohol polyoxyethylene ether is 5; Alkylphenol polyoxyethylene ether is 3; Alkyl alcohol amide is 8; Glycol alkyl ether is 7; Chelating agent ethylenediaminetetraacetic acid is 3; Chloric acid is 6; H 2 O 2 It is 2; deionized water is the balance, and the total number is 100.

[0041] The cleaning agent SEH-2 consists of the following components in parts by mass: coconut oil alkyl amide phosphate is 15; triethanolamine oleic acid soap is 15; triethanolamine is 1; aminotriacetic acid is 0.1; potassium hydroxide is 2; Ionized water is the balance, and the total number of parts is 100.

[0042] The cleaning agent SEH-3 is composed of the following components in parts by mass: acetic acid is 10; citric acid is 10; sorbitol is 0.1; deionized water is the balance, and the total numb...

Example Embodiment

[0048] Example 2

[0049] Step 1. Prepare three cleaning agents of SEH-1, SEH-2 and SEH-3 according to the following proportions. The cleaning agent SEH-1 is composed of the following components in parts by mass: fatty alcohol polyoxyethylene ether is 25; alkylphenol polyoxyethylene ether is 15; alkyl alcohol amide is 2; glycol alkyl ether is 0.5; chelating agent citric acid is 5; chloric acid is 10; H 2 O 2 Is 0.5; deionized water is the balance, and the total number is 100.

[0050] The cleaning agent SEH-2 is composed of the following components in parts by mass: coconut oil alkyl amide phosphate is 4; triethanolamine oleic acid soap is 3; triethanolamine is 5; aminotriacetic acid is 5; potassium hydroxide is 5; Ionized water is the balance, and the total number of parts is 100.

[0051] The cleaning agent SEH-3 is composed of the following components in parts by mass: acetic acid is 5; citric acid is 0.5; sorbitol is 5; deionized water is the balance, and the total number of par...

Example Embodiment

[0057] Example 3

[0058] Step 1. Prepare three cleaning agents, SEH-1, SEH-2, and SEH-3 according to the following proportions. The cleaning agent SEH-1 is composed of the following components by mass: fatty alcohol polyoxyethylene ether is 8; Alkylphenol polyoxyethylene ether is 5; Alkyl alcohol amide is 4; Glycol alkyl ether is 2; Chelating agent hydroxyethylene diphosphonic acid is 0.1; Chloric acid is 5; H 2 O 2 It is 5; deionized water is the balance, and the total number is 100.

[0059] The cleaning agent SEH-2 is composed of the following components in parts by mass: coconut oil alkyl amide phosphate is 6; triethanolamine oleic acid soap is 5; triethanolamine is 2; aminotriacetic acid is 1; potassium hydroxide is 1; Ionized water is the balance, and the total number of parts is 100.

[0060] The cleaning agent SEH-3 is composed of the following components in parts by mass: acetic acid is 5; citric acid is 0.5; sorbitol is 0.1; deionized water is the balance, and the total n...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Resistivityaaaaaaaaaa
Login to view more

Abstract

The invention discloses formulas of a cleaning agent SEH-1, a cleaning agent SHE-2 and a cleaning agent SHE-3, wherein the cleaning agent SEH-1 comprises the following components in parts by weight: 5-25 parts of fatty alcohol polyoxyethylene ether, 3-15 parts of alkyl phenyl polyoxyethylene ether, 2-8 parts of alkylolamide, 0.5-7 parts of ethylene glycol alkyl ether, 0.1-5 parts of chelating agent, 5-10 parts of chloracid, 0.5-5 parts of H2O2 (hydrogen peroxide) and the balance of deionized water, and the total number of parts is 100; the cleaning agent SHE-2 comprises the following components in parts by weight: 4-15 parts of coconut oil alkyl amide phosphate, 3-15 parts of triethanolamine oleic soap, 1-5 parts of triethanolamine, 0.1-5 parts of aminotriacetic acid, 1-5 parts of potassium hydroxide and the balance of the deionized water, and the total number of parts is 100; and the cleaning agent SHE-3 comprises the following components in parts by weight: 5-10 parts of acetic acid, 0.5-10 parts of citric acid, 0.1-5 parts of sorbitol and the balance of the deionized water, and the total number of parts is 100. The invention further discloses a method for cleaning silicon materials by utilizing the three cleaning agents. The method is completely in line with the cleaning requirement for production of solar grade single crystal silicon and does not pollute the environment.

Description

technical field [0001] The invention belongs to the technical field of silicon single crystal manufacturing, and specifically relates to a silicon material cleaning agent, and also relates to a method for cleaning silicon material by using the silicon material cleaning agent. Background technique [0002] In the manufacturing process of solar-grade silicon single crystal, primary polycrystalline silicon or regenerated silicon material needs to be used as raw material, which is melted in a single crystal furnace and drawn into a single crystal rod. The silicon material used for drawing single crystal rods has higher purity requirements, but the surface of the silicon material will be polluted during processing, transportation, and storage; therefore, it must be cleaned before using these silicon materials, mainly to remove organic matter and oxide layers. Contamination with metal ions, in particular, it is required that no metal impurities remain to the greatest extent. [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C11D1/825C11D3/20C11D3/24C11D1/83C11D3/30C11D3/04C11D3/60C11D7/26B08B3/08B08B3/12
Inventor 张群社赵可武李淑丽王彦利
Owner LONGI GREEN ENERGY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap