Separation method of LED (light emitting diode) epitaxy chip
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SUZHOU NAFANG TECH DEV
- Publication Date
- 2011-08-17
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Abstract
Description
technical field
[0001] The invention relates to a method for preparing a semiconductor chip, in particular to a method for separating LED epitaxial chips based on a hard substrate. Background technique
[0002] The new generation of semiconductor materials represented by GaN has great application potential in the fields of solid-state lighting, solid-state lasers, optical information storage, and ultraviolet detectors.
[0003] At present, common GaN-based light-emitting elements mainly use wafers formed of materials such as sapphire and silicon carbide as substrates. The manufacturing process includes: growing on the substrate to form an epitaxial structure, and then cutting the substrate into individual LED chips.
[0004] The traditional cutting method is to use a diamond knife as a cutting tool to cut the surface of the substrate first, and then perform the fracture process. However, substrates such as sapphire and silicon carbide have great hardness and strength, so cu...