Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacturing method of flexible mems drag-reducing skin

A manufacturing method and skinning technology, applied in the manufacture of microstructure devices, processes for producing decorative surface effects, coatings, etc., can solve the problem of limited materials and etching methods, and difficult etching of polymer materials with high aspect ratios. problems, to achieve the effect of stable residence, high flexibility and good fluidity

Inactive Publication Date: 2011-12-28
TSINGHUA UNIV
View PDF4 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The disadvantage of the manufacturing method of the flexible MEMS drag-reducing skin disclosed in Chinese patent ZL200910079713.0 is that the process of preparing the micro-pit structure of the polymer surface layer is photolithography and etching, which requires that the selected material needs to be able to There is a suitable etching method, and the high aspect ratio etching of polymer materials has always been a difficult point in the MEMS process. Currently, the available materials and etching methods are very limited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of flexible mems drag-reducing skin
  • Manufacturing method of flexible mems drag-reducing skin
  • Manufacturing method of flexible mems drag-reducing skin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] The manufacturing method comprises the steps of:

[0061] 1.1. Mold preparation: use the ICP etching process to process a micro-protrusion column array on the silicon wafer to form a silicon mold, and the height of the convex column structure is 10-100 μm.

[0062] 1.2. Preparation of micro-pit surface layer: Coat the PDMS prepolymer (the mass ratio of PDMS monomer to curing agent is 10:1) on the surface of the silicon mold, then vacuumize for 10 minutes to remove air bubbles, and let the mixed solution fully Fill the silicon mold. Next, a piece of PMMA film 10 (i.e. upper cover film) is pressed tightly on the PDMS prepolymer 9, as Figure 10 shown. Apply and maintain a uniform load on the PMMA film, place it in an oven, and heat it at 90 °C for 60 min to cure the PDMS. After curing is complete, the PMMA film is dissolved away using acetone. At this time, the formed surface layer is slightly higher than the upper surface of the mold 1 . The surface layer of the mic...

Embodiment 2

[0070] The manufacturing method comprises the steps of:

[0071] 2.1. Preparation of mold 1: A nickel mold containing a micro-protrusion column array is processed by a micro-electroforming process, and the height of the convex column structure is 10-200 μm.

[0072] 2.2. Preparation of the surface layer 2 of the micro-pit: a PMMA film 10 (i.e. upper cover film) is pressed on the upper surface of the mold 1 to form a criss-cross micropipe together with the mold 1, and then the prepolymer 9 of PDMS (PDMS single The mass ratio of body to curing agent is 10:1) from one end of the mold 1, and the PDMS is filled with the mold 1 by capillary force, such as Figure 4 As shown, the mold 1, PDMS9, and PMMA film 10 are then heated as a whole, heated at 90° C. for 60 minutes to cure the PDMS, and finally the PMMA film 10 is removed by dissolving with acetone.

[0073] 2.3. Preparation of adhesion layer: Spin coating of polyimide prepolymer to obtain a polyimide layer with a thickness of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention which discloses a manufacturing method of a flexible MEMS anti-drag skin belongs to the micromachining field, and the manufacturing method is designed to provide an improved manufacturing process. The manufacturing method of the invention comprises the following steps: preparing a die which contains a dimpling column array, wherein the shape of the dimpling column array is opposite to the shape of micro-pits on the surface layer of the skin; forming the surface layer of the anti-drag skin by filling the die with a prepolymer of a polymer, and curing; preparing an adhesive layer on the surface layer; preparing a metal layer on the adhesive layer, and forming an electrolytic anode, an electrolytic cathode, an anode lead terminal, a cathode lead terminal, and an internal connection lead with an MEMS plane fine technology; preparing a flexible insulation substrate on the adhesive layer and the metal layer; removing the flexible insulation substrate on a position corresponding to a lead terminal; demolding; and removing the adhesive layer on a position corresponding to micro-pits of the surface layer to expose metal electrodes. The manufacturing method of the present invention is suitable for manufacturing the flexible MEMS anti-drag skin which treats the polymer difficult to etch as a surface layer material.

Description

technical field [0001] The invention relates to the technical fields of micro-manufacturing and flexible MEMS, in particular to a method for manufacturing a flexible MEMS (Micro Electro-Mechanical System) drag-reducing skin. Background technique [0002] The travel resistance encountered by water surface and underwater vehicles includes pressure difference resistance, wave resistance and surface friction resistance, among which surface friction usually occupies the largest proportion. For vehicles with large length and aspect ratio / length-to-diameter ratio This is especially true. Therefore, reducing the frictional resistance of the surface of the vehicle can effectively increase the speed, increase the range, and reduce energy consumption, which has great economic value. [0003] At present, the theoretical and applied research of frictional drag reduction technology mainly focuses on the turbulent boundary layer, involving a variety of technical solutions, such as surface...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
Inventor 李勇李文平朱效谷
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products