High-temperature-resistant far infrared radiation coating

A far-infrared radiation and high-temperature-resistant technology, which is applied in the field of high-temperature-resistant far-infrared radiation coatings, can solve the problems that it is difficult for materials to meet the requirements of firm structure, high thermal insulation and high reflectivity.

Inactive Publication Date: 2012-07-11

赵志海

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AI-Extracted Technical Summary

Problems solved by technology

[0002] Industrial kilns, furnaces, and boilers usually burn at a high temperature above 1000°C. The structural materials of the furnace body are mainly various refractory materials such as high bricks, clay bricks, castables, ceramic fibers, etc. These are the structure of the furnace body. Materials are also thermal insulatio...

Abstract

The invention relates to a high-temperature-resistant far infrared radiation coating which is an energy-saving coating with high-temperature resistance, high radiance, corrosion resistance, high wear resistance and a special function. The coating is prepared by doping transition element oxide, zirconium oxide and a silicate fireproof material at high temperature to form a solid solution, so that the impurity energy level is increased, the infrared radiation coefficient is improved, and high corresponding properties such as heat resistance, corrosion resistance, wear resistance and the like are kept; and the activity of reactants can be improved by doping rare earth element oxide (Y2O3) in the coating, the coating has high binding force with a substrate and can permeate the substrate to form a transition layer and a coating structure, the phenomenon that a hearth is coked can be avoided, the emission of flue gas and energy consumption are reduced, and mechanical shock resistance and thermal shock resistance are achieved.

Technology Topic

PhysicsRare-earth element +17

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Examples

Experimental program(1)

Example Embodiment

[0007] First grind the ⑴extreme chromium trioxide powder into a fine powder of 500 mesh or more, ⑵high-mole potassium silicate solution is stirred and matured at high speed, the rotation speed of the mixer should reach 3500/min or more, stir for more than 30 minutes, and the stirred ⑵high mole silicon The potassium acid solution is allowed to mature for more than 2 hours;

[0008] The matured high-mole potassium silicate solution is gradually added to the ground fine chromium trioxide, Y under stirring at 3000/min 2 O 3 , Manganese dioxide, zirconia, alpha alumina, titanium dioxide materials, stir for 30 minutes and then add carboxymethyl cellulose, bactericide, dispersant, stabilizer, PH regulator, and then stir at high speed after adding, the mixer revolutions To reach 4500/min or more, the stirring time is 30 minutes.

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