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Method for high-throughput screening of photochemical catalysts based on photoelectric property and special chip thereof

A photocatalyst and photoelectric performance technology, which is applied in the direction of measuring devices, material analysis through optical means, instruments, etc., can solve the problems of several hours to tens of hours, low photocatalyst efficiency, singleness, etc., and achieve time-consuming short effect

Inactive Publication Date: 2012-08-01
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, such a degradation process usually takes several hours to dozens of hours, and each degradation process can only evaluate one material system, so it is necessary to evaluate and screen photocatalyst efficiency through this catalytic degradation simulation process. very low
Not only that, the apparent degradation efficiency can only show the specific degradation performance of a specific catalyst under specific pollutants, and the information that can be obtained is very single and apparent

Method used

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  • Method for high-throughput screening of photochemical catalysts based on photoelectric property and special chip thereof
  • Method for high-throughput screening of photochemical catalysts based on photoelectric property and special chip thereof
  • Method for high-throughput screening of photochemical catalysts based on photoelectric property and special chip thereof

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Experimental program
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Effect test

Embodiment 1

[0030] image 3 It is a typical photocurrent time domain test curve.

[0031] The ZnO sample is selected for this test, the light source is an ultraviolet LED lamp with a wavelength of 365nm, and the electric field is a DC voltage of 1V output by a common regulated power supply. During the test, the following operations are performed in sequence, the DC 1V bias is turned on at 20 seconds, the light source is turned on at 40 seconds, and the light source is turned off at 450 seconds.

[0032] The entire photocurrent time-domain test curve can be divided into three parts. After the power is turned on, the stage before the light is turned on is the dark state stable stage; the process of lighting is the photocurrent response stage; the stage after the light is turned off is the photocurrent relaxation stage. Among them, the photocurrent in the dark state stable stage indicates the dark current of the semiconductor material, which corresponds to the information of the carrier ba...

Embodiment 2

[0035] Figure 4 It is a typical photocurrent frequency domain test curve.

[0036] The ZnO sample was chosen for this test. The light source is a full-spectrum xenon lamp, followed by a monochromator to realize the output of a controllable single-wavelength light source. The bias voltage is selected as the DC voltage 1V output by the common regulated power supply. During the test process, the following operations are carried out, the voltage of 1V is always kept on, the monochromator is controlled to output a single wavelength light source from 200nm to 900nm at a rate of 1nm / s, and the current change in the circuit is recorded. This test process is called Forward photocurrent frequency domain test curve. Correspondingly, if other conditions remain unchanged, and the output wavelength is from 900nm to 200nm, we call this process the reverse photocurrent frequency domain test curve. Figure 4 That is, the forward and reverse photocurrent test curves in this typical embodim...

Embodiment 3

[0039] Figure 5 It is a typical light excitation gas sensitivity test curve.

[0040] ZnO and TiO were chosen for this test 2 For the sample, the light source is a 365nm ultraviolet LED flat light source. The bias voltage is selected as the DC voltage 1V output by the common regulated power supply. The organic atmosphere is 75ppm formaldehyde gas. During the test, the following operations are performed, the external bias voltage and the ultraviolet light source are turned on in turn, and after the photocurrent reaches a steady state, the formaldehyde atmosphere is introduced (the air flow rate is 500ml / min), and different materials will show different response dynamics. ,Such as Figure 5 shown. The relevant information of the material depletion layer can be analyzed through the difference of the response rate. The depletion layer is an important structure for separating photogenerated electron holes. Generally, the more sensitive it is to the reducing atmosphere (sensi...

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Abstract

The invention discloses a method for high-throughput screening of photochemical catalysts based on photoelectric property and a special chip thereof. Evaluation of traditional photochemical catalysts is conducted by constructing a photocatalysis reactor to simulate degradatipon processes of organism, the traditional method is long in time consuming, one sample can be tested in one time, and only appearance degradation performance of materials can be obtained. The method for high-throughput screening of photochemical catalysts based on photoelectric properties relates to the high-throughput material chip for testing and a plurality of controllable external fields of light, electricity, heat, magnetism, atmosphere and the like. The material chip with high throughput ensures high screening efficiency, various testing flows including time domain testing of light currents, frequency domain testing of light currents, light hall testing, optical excitation air-sensitive testing and the like can be performed through combination of any of the plurality of external fields so as to evaluate and screen semiconductor materials for the photochemical catalysts. The method can forecast photochemical catalysis performance of materials in high throughput mode, can obtain abundant physical chemical performance parameters of the materials and has application prospects in developing of novel photochemical catalysts with high performance and high solar utilization rate.

Description

technical field [0001] The present invention relates to the interdisciplinary field of new energy utilization and new material development, and specifically refers to a method for high-throughput screening of photocatalysts based on photoelectric properties. catalyst of light. technical background [0002] Photocatalytic technology has broad application prospects in environmental protection, solar energy utilization, and development of new functional materials. It is a high-tech with significant economic and social benefits. Photocatalysis is one of the most potential ways to solve the environmental crisis and energy crisis faced by human beings, and it has attracted more and more attention. [0003] The basic principle of photocatalysis is that semiconductor photocatalysts can generate a large number of active substances (reducing electrons and oxidizing holes) under the excitation of photons to degrade organic pollutants in water and the atmosphere. Titanium dioxide (TiO...

Claims

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Application Information

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IPC IPC(8): G01N21/00
Inventor 谢长生刘源邹志军余雪里曾大文
Owner HUAZHONG UNIV OF SCI & TECH