Gas chromatography valve path system for analyzing multiple high-purity fluorine-containing electronic gases and using method of system

Abstract

The invention discloses a gas chromatography valve path system for analyzing multiple high-purity fluorine-containing electronic gases and a using method of the system. The system comprises 2 four-way valves, 2 ten-way valves, 1 eight-way valve, 1 quantitative ring, 4 chromatographic columns, 14 pressure balance regulation valves and 1 discharge ionization detector; and the carrier gas of the system is high-purity helium. According to the invention, a five-valve four-column valve path system is adopted, and the measurement of multiple gas-phase impurities can be finished by once sample introduction. The valve path system is convenient to operate and applicable to the industrial production in the field of high-purity fluorine-containing electronic gases.

Description

technical field [0001] The invention relates to a multidimensional gas chromatography valve circuit system, in particular to a gas chromatography valve circuit system for analyzing various high-purity fluorine-containing electronic gases. Background technique [0002] Fluorine-containing electronic gases are mainly used as cleaning agents and plasma etchant for chemical vapor deposition in electronics, semiconductor industry and photovoltaic industry. With the rapid development of related fields such as TFT-LCD panel industry, semiconductor industry and solar panel industry in recent years, the consumption of fluorine-containing electronic gases is also increasing. [0003] If impurities such as H in the high-purity fluorine-containing electron gas 2 , O 2 , N 2 、CH 4 , CO, CO 2 , N 2 If the content of O is too high, it will seriously affect its performance in cleaning and etching, so the requirements for analysis and detection are relatively high. At present, in the ...

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Problems solved by technology

At present, in the national standards and foreign standards (such as IEC, SEMI, ASTM, etc.) related to the detection of the above-mentioned high-purity fluorine-containing electronic gases, corresponding regulations have been made on the analysis methods of gas impurities, and some of them have clearly given the valve system. For example, "Industrial Sulfur Hexafluoride" (GB / T 12022-2006), "Gas Sulfur Hexafluoride for Electronic Industry" (GB / T 18867-2002), ASTM D2472-00 (SF 6 ), SEMI C3.24-0301 (SF 6 ), IEC 60376-2005 (SF 6 ), "Gas Nitrogen Trifluoride for Electronic Industry" (GB / T 21287-2007), SEMIC3.39-0999 (NF 3 ), SEMI C3.40-1000 (CF 4 ), SEMI C3.21-90 (CF 4 ), SEMIC3.37-0701 (C 2 f 6 ), SEMI C3.52-0200 (WF 6 ), SEMI C3.58-0303 (C 4 f 8 ), etc., but the gas path in the analysis methods listed in these standards is relatively single. To complete the analysis of a gas impurity, multiple instruments or multiple injections are required. The analysis efficiency is low, the operation is cumbersome, and the analysis cost is high. It is not suitable for industrial production. Analysis and detection of

[0004] US 20100154511A1 introduces a device and method for multidimensional gas chromatography, which uses a single-valve, three-column, and two-detector valve system, and focuses on the working principles of different types of switching valves. If there are many types of impurities in the main component , can’t meet the needs of analysis; CN102053129A introduces a chromatographic process that adopts two valves and two columns to analyze electronic grade carbon tetrafluoride. 2 , O 2 and CO separation and analysis; CN201780285U and CN101915811A introduce a device and method for analyzing and detecting impurities in high-purity non-corrosive gases, using four valves and five columns to analyze high-purity oxygen and other non-corrosive gases. Gas, introduces its working principle, through the valve circuit switching to analyze the large molecular weight and small molecular weight impurity components in the main component, only the rough separation of the components can be achieved

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